{"title":"准分子激光烧蚀玻璃微加工研究","authors":"F. V. Alvensleben, C. Graumann, J. Wais","doi":"10.1109/CLEOE.1998.719464","DOIUrl":null,"url":null,"abstract":"Micro-structuring of glass has been examined using UV radiation. The etch depth profile has been investigated. The limitations and possibilities for micro-structuring on glass has been found for the wavelengths of 193nm, 248nm and 308nm.","PeriodicalId":10610,"journal":{"name":"Conference on Lasers and Electro-Optics Europe","volume":"21 12","pages":""},"PeriodicalIF":0.0000,"publicationDate":"1998-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Micro-Machining of Glass by Excimer Laser Ablation\",\"authors\":\"F. V. Alvensleben, C. Graumann, J. Wais\",\"doi\":\"10.1109/CLEOE.1998.719464\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Micro-structuring of glass has been examined using UV radiation. The etch depth profile has been investigated. The limitations and possibilities for micro-structuring on glass has been found for the wavelengths of 193nm, 248nm and 308nm.\",\"PeriodicalId\":10610,\"journal\":{\"name\":\"Conference on Lasers and Electro-Optics Europe\",\"volume\":\"21 12\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Conference on Lasers and Electro-Optics Europe\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CLEOE.1998.719464\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference on Lasers and Electro-Optics Europe","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CLEOE.1998.719464","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Micro-Machining of Glass by Excimer Laser Ablation
Micro-structuring of glass has been examined using UV radiation. The etch depth profile has been investigated. The limitations and possibilities for micro-structuring on glass has been found for the wavelengths of 193nm, 248nm and 308nm.
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