外延诱导相稳定:MBE生长PbSe/CaF2/Si薄膜的实验与弹性理论对比研究

G Breton , T Maurice , P Masri , S Charar , M Averous
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引用次数: 3

摘要

现代外延生长技术表明,只要使用合适的衬底,就可以通过外延生长实现材料相稳定。缓冲层(BL)在外延生长优化中起着至关重要的作用。通过将BL/s异质结构连续性条件应用于相关的应变相关特征,我们执行了涉及BL成分的自一致生长优化策略。这些与应变相关的相依赖特征的计算使得基于外延实验和理论预测的生长材料相确定方法得以实现。为了说明这种方法,我们研究了MBE生长的铅盐IV-VI PbSe/CaF2/Si(111)涂层。对于优化的BL,在沉淀PbSe层之前,在CaF2层的Se通量下生长了一层薄的CaFSe层。通过对所有样品进行高分辨率x射线衍射、原子力显微镜(结构质量)和霍尔效应(电学性能)表征,证明了连续性条件在优化MBE生长方面的效率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Epitaxy induced phase stabilization: a comparative experimental and elasticity-based theoretical study on MBE grown PbSe/CaF2/Si epilayer

Modern epitaxial growth techniques show that material-phase stabilization can be achieved by epitaxial growth provided that suitable substrate (s) are used. Buffer layers (BL) play a vital role in epitaxial growth optimisation. By applying through the BL/s heterostructure continuity conditions on relevant strain-related features, we perform a self-consistent growth-optimisation strategy involving BL compositions. The calculation of these strain-related phase-dependent features enables to achieve an approach of as-grown material phase determination based on epitaxy experiments and theoretical previsions. To illustrate this methodology, we have investigated the lead salt IV–VI PbSe/CaF2/Si(111) epilayer grown by MBE. For the optimised BL, a thin CaFSe layer has been grown under Se flux of CaF2 layer before deposition of the PbSe layer. The efficiency of the continuity conditions in optimising MBE growth is shown by characterising all samples by high-resolution X-ray diffraction, atomic force microscopy for structural quality and Hall effect for electrical properties.

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