SPEEM: BESSY II专用微聚焦PGM光束线UE49-PGMa的光电发射显微镜

F. Kronast, Sergio Valencia Molina
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引用次数: 19

摘要

UE49-PGMa光束线拥有一个光电子显微镜(PEEM),专门用于纳米尺度的光谱显微镜和元素选择性磁成像。该仪器为Elmitec PEEM III型,配有能量过滤器和氦冷却机械手。激光驱动的激发可以用一个附加的Ti:Sa激光器来研究。各种定制样品支架可用于在中等磁场/电场,温度控制或局部激光激励下成像。使用x射线,该仪器的空间分辨率可达30纳米。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
SPEEM: The photoemission microscope at the dedicated microfocus PGM beamline UE49-PGMa at BESSY II
The UE49-PGMa beamline hosts a photoemission electron microscope (PEEM) dedicated to spectromicroscopy and element-selective magnetic imaging on the nanometer scale. The instrument is an Elmitec PEEM III equipped with energy filter and Helium cooled manipulator. Laser driven excitations can be studied using an attached Ti:Sa laser. A variety of customized sample holders is available for imaging in moderate magnetic / electric field, temperature control, or local laser excitations. With x-rays the instrument is capable of 30 nm spatial resolution.
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