{"title":"反应溅射法制备纳米多孔TiN薄膜","authors":"Q Fang , J.-Y Zhang","doi":"10.1016/S1466-6049(01)00124-6","DOIUrl":null,"url":null,"abstract":"<div><p><span>Nano-porous TiN<span> thin films<span> deposited by a reactive sputtering process are reported. The effect of deposition parameters including sputtering power density, nitrogen partial pressure and deposition time on the thin film growth has been investigated. Crystallisation behaviour, chemical composition and microstructure of the deposited films were also investigated using X-ray diffraction, EDX and scanning electron microscopy. A test cell of Na(l)/beta” alumina/TiN was set up and tested at the temperature range of 600–800°C, in order to investigate the cell power density and the interfacial electrical property between the electrolyte and TiN electrode. The maximum power density of 0.20 W cm</span></span></span><sup>−2</sup> could be achieved with a large electrode area of 30 cm<sup>2</sup> at 800°C. The effect of microstructure of the nanometer size thin film electrodes on the conductive property has been studied and discussed.</p></div>","PeriodicalId":100700,"journal":{"name":"International Journal of Inorganic Materials","volume":"3 8","pages":"Pages 1193-1196"},"PeriodicalIF":0.0000,"publicationDate":"2001-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/S1466-6049(01)00124-6","citationCount":"8","resultStr":"{\"title\":\"Nano-porous TiN thin films deposited by reactive sputtering method\",\"authors\":\"Q Fang , J.-Y Zhang\",\"doi\":\"10.1016/S1466-6049(01)00124-6\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p><span>Nano-porous TiN<span> thin films<span> deposited by a reactive sputtering process are reported. The effect of deposition parameters including sputtering power density, nitrogen partial pressure and deposition time on the thin film growth has been investigated. Crystallisation behaviour, chemical composition and microstructure of the deposited films were also investigated using X-ray diffraction, EDX and scanning electron microscopy. A test cell of Na(l)/beta” alumina/TiN was set up and tested at the temperature range of 600–800°C, in order to investigate the cell power density and the interfacial electrical property between the electrolyte and TiN electrode. The maximum power density of 0.20 W cm</span></span></span><sup>−2</sup> could be achieved with a large electrode area of 30 cm<sup>2</sup> at 800°C. The effect of microstructure of the nanometer size thin film electrodes on the conductive property has been studied and discussed.</p></div>\",\"PeriodicalId\":100700,\"journal\":{\"name\":\"International Journal of Inorganic Materials\",\"volume\":\"3 8\",\"pages\":\"Pages 1193-1196\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2001-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/S1466-6049(01)00124-6\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Journal of Inorganic Materials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S1466604901001246\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of Inorganic Materials","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1466604901001246","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 8
摘要
报道了反应溅射法制备纳米多孔TiN薄膜。研究了溅射功率密度、氮分压和沉积时间等沉积参数对薄膜生长的影响。利用x射线衍射、EDX和扫描电子显微镜研究了沉积膜的结晶行为、化学成分和微观结构。建立了Na(l)/beta”氧化铝/TiN的测试电池,并在600 ~ 800℃的温度范围内进行了测试,以研究电池的功率密度和电解质与TiN电极之间的界面电学性能。在800℃条件下,当电极面积为30 cm2时,最大功率密度可达0.20 W cm−2。研究和讨论了纳米尺寸薄膜电极的微观结构对导电性能的影响。
Nano-porous TiN thin films deposited by reactive sputtering method
Nano-porous TiN thin films deposited by a reactive sputtering process are reported. The effect of deposition parameters including sputtering power density, nitrogen partial pressure and deposition time on the thin film growth has been investigated. Crystallisation behaviour, chemical composition and microstructure of the deposited films were also investigated using X-ray diffraction, EDX and scanning electron microscopy. A test cell of Na(l)/beta” alumina/TiN was set up and tested at the temperature range of 600–800°C, in order to investigate the cell power density and the interfacial electrical property between the electrolyte and TiN electrode. The maximum power density of 0.20 W cm−2 could be achieved with a large electrode area of 30 cm2 at 800°C. The effect of microstructure of the nanometer size thin film electrodes on the conductive property has been studied and discussed.