用分立二极管精确测定SiC MOSFET结构热阻的另一种方法

A. Vass-Várnai, Youngmin Cho, G. Farkas, M. Rencz
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引用次数: 1

摘要

为了确定功率半导体器件和结构的热性能,JEDEC JESD 51-1静电、电测试方法是一种众所周知且被行业广泛接受的技术。该方法在所有情况下都能提供准确和可重复的结果。对于某些化合物半导体元件,如SiC MOSFET-s和GaN HEMT结构,电测试方法的应用在某些情况下变得具有挑战性。如果使用传统的测试设置,在单位阶跃响应函数中,由于寄生效应,电信号可能会叠加在感兴趣的热信号上,使测试结果难以甚至无法分析。如果该结构也具有物理二极管,则可以使用它来了解封装及其层的热特性。这些信息也可以应用于另一个步骤,即从芯片晶体管的角度收集热性能,而无需测量它。在本文中,我们展示了一种基于测量和模拟的组合方法,即使在其他方法可能失败的情况下,也可以对此类组件进行准确的热表征。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
An Alternative Method to Accurately Determine the Thermal Resistance of SiC MOSFET Structures with Discrete Diodes
To determine the thermal properties of power semiconductor devices and structures, the JEDEC JESD 51-1 static, electrical test method is a well-known and industry-wide accepted technique. The approach provides accurate and repeatable results in case of silicon based transistors in all cases. For certain compound semiconductor components, such as SiC MOSFET-s and GaN HEMT structures, the application of the electrical test method becomes in some cases challenging. If traditional test setups are used, in the unit step response function, due to parasitic effects, an electric signal may superpose on the thermal signal of interest, making it hard or even impossible to analyze the test results. If the structure has a physical diode as well, it can be used to understand the thermal properties of the package and its layers. This information can be applied in another step to gather the thermal properties from die transistors’ point of view as well, without measuring it. In this article we show a combined measurement and simulation based method, which allows the accurate thermal characterization of such components, even in cases when other approaches may fail.
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