用于制备离子晶体表面的超高真空切割机。

T. Sander, Yi Liu, T. Pham, M. Ammon, Mirunalini Devarajulu, S. Maier
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引用次数: 1

摘要

在超高真空条件下原位切割单晶提供了一种可靠而直接的方法来制备清洁和原子定义良好的表面。在这里,我们提出了一种多功能的样品切割器,可以在超高真空条件下高效地制备离子晶体表面,适用于制备较软的材料,如碱卤化物,和较硬的材料,如金属氧化物。所述切割刀设计的优点之一是将用于支撑晶体的切割刀片和砧并入该装置中。因此不需要特别强的机械机械手,与现有的配有xyz机械手的真空室兼容。我们展示了在超高真空条件下原位制备的NaCl(001)、KBr(001)、NiO(001)和MgO(001)解理面的原子平面和原子结构,并通过低温非接触原子力显微镜成像。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Ultra-high vacuum cleaver for the preparation of ionic crystal surfaces.
Cleaving single crystals in situ under ultra-high vacuum conditions provides a reliable and straightforward approach to prepare clean and atomically well-defined surfaces. Here, we present a versatile sample cleaver to efficiently prepare ionic crystal surfaces under ultra-high vacuum conditions, which is suitable for preparation of softer materials, such as alkali halides, and harder materials, such as metal oxides. One of the advantages of the presented cleaver design is that the cleaving blade and anvil to support the crystal are incorporated into the device. Therefore, no particularly strong mechanical manipulator is needed, and it is compatible with existing vacuum chambers equipped with an xyz-manipulator. We demonstrate atomically flat terraces and the atomic structure of NaCl(001), KBr(001), NiO(001), and MgO(001) cleavage planes prepared in situ under ultra-high vacuum conditions and imaged by low-temperature non-contact atomic force microscopy.
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