Alma Mh, A. Kökçe, H. E. Lapa, A. Özdemir, S. Altındal
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引用次数: 1
摘要
采用同一晶片制备了Au/n-4H SiC (MS)和Au/(Zn掺杂pva)/n-4H SiC (MPS)结构。通过测量电流-电压(I-V)数据,研究了掺杂Zn纳米粒子的改性PVA中间层对理想因数(n)、势垒高度(BH)、串联电阻(Rs)和整流率(RR)等主要电学参数的影响。此外,通过考虑与电压相关的BH和n,还从这些数据中获得了表面态(Nss)的能量依赖分布。还评估了在MS和MPS结构的积累区域观察到的负电容(NC)的来源。通过电容电压(C-V)和电导演化(G/ω-V)数据测量,利用Nicollian-Brews技术对高频(1 MHz)下Rs和Nss的电压依赖性进行了评估和研究。这些结果解释了纳米锌掺杂改性PVA界面层对MPS结构相对于MS结构的RR升高、Rs值、Nss值和漏电流值降低的影响。因此,我们可以说MPS结构性能的提高是Au和n-4H SiC之间(掺杂zn的PVA)层生长的结果。
The Effect of Modified PVA Interfacial Layer Doped by Zn Nanoparticles on the Electrical Parameters of Au/N-4H Sic (MS) Structures
Both Au/n-4H SiC (MS) and Au/(Zn doped-PVA)/n-4H SiC (MPS) structures were fabricated by using the same wafer. This effect of modified PVA interlayer doped by Zn nanoparticles on main electrical parameters, such as ideality factor (n), barrier height (BH), series resistance (Rs), and rectification rate (RR) were evaluated and investigated by using the current-voltage (I-V) data measurements. Furthermore, the energy dependent profile of surface states (Nss) was also obtained from these data by taking into account voltage dependent BH and n. The sources of observed negative capacitance (NC) at the accumulation region for the MS and MPS structures were also evaluated. From capacitance-voltage (C-V) and conductancevoltage (G/ω-V) data measurements, the profile of Rs and Nss were also evaluated and investigated as voltage dependent at high frequency (1 MHz) by using Nicollian-Brews technique. These results explain how is the effect of modified PVA interfacial layer doped by Zn nanoparticles on increasing in the RR and decreasing of the values of Rs, Nss, and leakage current of MPS structure as compared with MS structure. Thus, we can say that this increase in the performance of the MPS structure is a result of the grown of the (Zn-doped PVA) layer between Au and n-4H SiC.