二硒化铜铟缺陷水平的表征

F.A. Abou-Elfotouh, H. Moutinho, A. Bakry, T.J. Coutts, L.L. Kazmerski
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引用次数: 67

摘要

在10 K下进行了高分辨率光致发光(PL)测量,以确定与主导半导体CuInSe2 (CIS)的各种缺陷态相关的能级。在薄膜和单晶(抛光和切割)样品的裸露表面以及通过热共蒸发沉积在CIS吸收器表面的(Cd,Zn)S窗口层进行PL测量。提出了一个完整的能带图,以确定该材料中预期的12个本征缺陷状态的起源。在器件制造过程中使用的表面和热处理对缺陷状态(深和浅)的存在和产生的影响被识别并与器件性能相关联。较差的单晶器件性能与过程产生的高密度辐射表面复合态和陷阱能级有关。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Characterization of the defect levels in copper indium diselenide

High-resolution photoluminescence (PL) measurements were carried out at 10 K to identify the energy levels associated with the various defect states dominating the semiconductor CuInSe2 (CIS). PL measurements were taken on the bare surfaces of both thin film and single-crystal (polished and cleaved) samples and through a (Cd,Zn)S window layer deposited by thermal co-evaporation onto the CIS absorber surface. A complete energy band diagram is proposed which identifies the origin of the 12 intrinsic defect states expected in this material. The effects of surface and heat treatments, used in device fabrication processing, on the existence and generation of defect states (deep and shallow) are identified and correlated with the device performance. The inferior single-crystal device performance is correlated with presence of a high density of process-generated radiative surface recombination states and trap levels.

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