低电阻率硅SU-S厚负光刻胶上的低损耗共面线

IF 0.1 0 THEATER

Teatro e Storia Pub Date : 2005-12-19 DOI:10.1109/SMICND.2005.1558722

R. Marcelli, S. Catoni, L. Frenguelli

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引用次数: 7

摘要

介绍了一种获得低损耗共面波导(CPW)线的新方法。采用SU-S厚负光刻胶在低阻硅上进行光刻工艺，获得相对于衬底升高的CPW线，以获得几乎在空中的传输线结构的优势。

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Low loss coplanar lines on low resistivity silicon SU-S thick negative photoresist

In this paper a new approach to obtain low losses coplanar waveguide (CPW) lines is described. A photolithographic process is performed by using SU-S thick negative photo-resist on low resistivity silicon to obtain CPW lines elevated with respect to the substrate to get the advantages from transmission line structures which are almost on-the-air.

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Teatro e Storia THEATER-

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