从圆窗到下丘仿生听力修复的最新进展

Colletti, R. Shannon, M. Mandalà, M. Carner, S. Veronese, L. Colletti
{"title":"从圆窗到下丘仿生听力修复的最新进展","authors":"Colletti, R. Shannon, M. Mandalà, M. Carner, S. Veronese, L. Colletti","doi":"10.11289/OTOLJPN.19.677","DOIUrl":null,"url":null,"abstract":"INTRODUCTION Auditory restoration with implant technology has been a great success story in otology and the ultimate limits of the technology are still not known. Today there are a wide variety of approaches and auditory prostheses for restoration of hearing, each with a precise indication for specific degrees and sites of hearing loss (Figure 1). Modern auditory prostheses range from implants that impart mechanical energy to the cochlea (middle ear implants, MEIs) via the ossicular chain or bypass a damaged ossicular chain and vibrate the round window directly (round window implants, RWI). Cochlear implants (CIs) bypass damaged inner ear cells and electrically stimulate the auditory nerve within the cochlea. The auditory brainstem implant (ABI) bypasses a damaged cochlea and auditory nerve auditory and directly stimulate the brainstem nuclei. The inferior colliculus implant (ICI) or auditory midbrain implant (AMI) bypass damaged brainstem nuclei to stimulate the inferior colliculus in the midbrain. With the refinements in implant technology, patient selection criteria for the various implant devices need to be periodically reconsidered with a view to obtaining increasingly high levels of speech recognition for the different etiologies. In general it is thought that the more peripheral the implant, the better the chance of success. Indeed the more peripheral implants (RW, MEIs, CIs and ABIs in non-NF2 patients) have been 第19回日本耳科学会特別講演3","PeriodicalId":19601,"journal":{"name":"Otology Japan","volume":"143 1","pages":"677-685"},"PeriodicalIF":0.0000,"publicationDate":"2009-12-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Recent Developments in Bionic Hearing Restoration from the Round Window to the Inferior Colliculus\",\"authors\":\"Colletti, R. Shannon, M. Mandalà, M. Carner, S. Veronese, L. Colletti\",\"doi\":\"10.11289/OTOLJPN.19.677\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"INTRODUCTION Auditory restoration with implant technology has been a great success story in otology and the ultimate limits of the technology are still not known. Today there are a wide variety of approaches and auditory prostheses for restoration of hearing, each with a precise indication for specific degrees and sites of hearing loss (Figure 1). Modern auditory prostheses range from implants that impart mechanical energy to the cochlea (middle ear implants, MEIs) via the ossicular chain or bypass a damaged ossicular chain and vibrate the round window directly (round window implants, RWI). Cochlear implants (CIs) bypass damaged inner ear cells and electrically stimulate the auditory nerve within the cochlea. The auditory brainstem implant (ABI) bypasses a damaged cochlea and auditory nerve auditory and directly stimulate the brainstem nuclei. The inferior colliculus implant (ICI) or auditory midbrain implant (AMI) bypass damaged brainstem nuclei to stimulate the inferior colliculus in the midbrain. With the refinements in implant technology, patient selection criteria for the various implant devices need to be periodically reconsidered with a view to obtaining increasingly high levels of speech recognition for the different etiologies. In general it is thought that the more peripheral the implant, the better the chance of success. Indeed the more peripheral implants (RW, MEIs, CIs and ABIs in non-NF2 patients) have been 第19回日本耳科学会特別講演3\",\"PeriodicalId\":19601,\"journal\":{\"name\":\"Otology Japan\",\"volume\":\"143 1\",\"pages\":\"677-685\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-12-25\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Otology Japan\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.11289/OTOLJPN.19.677\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Otology Japan","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.11289/OTOLJPN.19.677","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

植入式听力修复技术在耳科已经取得了巨大的成功,但该技术的极限仍然未知。今天,有各种各样的方法和听觉假体来恢复听力,每一种都有听力损失的特定程度和部位的精确指示(图1)。现代听觉假体的范围从通过听骨链向耳蜗(中耳植入物,MEIs)传递机械能的植入物,到绕过受损听骨链直接振动圆形窗口的植入物(圆形窗口植入物,RWI)。人工耳蜗(CIs)绕过受损的内耳细胞,电刺激耳蜗内的听神经。听觉脑干植入(ABI)绕过受损的耳蜗和听神经,直接刺激脑干核。下丘植入(ICI)或听觉中脑植入(AMI)绕过受损的脑干核来刺激中脑下丘。随着植入技术的改进,需要定期重新考虑患者对各种植入装置的选择标准,以获得针对不同病因的越来越高水平的语音识别。一般认为,植入体越外围,成功的机会就越大。事实上,更多的外周植入物(非nf2患者的RW, MEIs, CIs和ABIs)已经被发现
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Recent Developments in Bionic Hearing Restoration from the Round Window to the Inferior Colliculus
INTRODUCTION Auditory restoration with implant technology has been a great success story in otology and the ultimate limits of the technology are still not known. Today there are a wide variety of approaches and auditory prostheses for restoration of hearing, each with a precise indication for specific degrees and sites of hearing loss (Figure 1). Modern auditory prostheses range from implants that impart mechanical energy to the cochlea (middle ear implants, MEIs) via the ossicular chain or bypass a damaged ossicular chain and vibrate the round window directly (round window implants, RWI). Cochlear implants (CIs) bypass damaged inner ear cells and electrically stimulate the auditory nerve within the cochlea. The auditory brainstem implant (ABI) bypasses a damaged cochlea and auditory nerve auditory and directly stimulate the brainstem nuclei. The inferior colliculus implant (ICI) or auditory midbrain implant (AMI) bypass damaged brainstem nuclei to stimulate the inferior colliculus in the midbrain. With the refinements in implant technology, patient selection criteria for the various implant devices need to be periodically reconsidered with a view to obtaining increasingly high levels of speech recognition for the different etiologies. In general it is thought that the more peripheral the implant, the better the chance of success. Indeed the more peripheral implants (RW, MEIs, CIs and ABIs in non-NF2 patients) have been 第19回日本耳科学会特別講演3
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信