利用雾化器喷雾热解技术研究薄膜的结构、光学和电学性质

R. Mariappan, V. Ponnuswamy, P. Jayamurugan, R. Jayaprakash, R. Suresh
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引用次数: 3

摘要

在衬底温度400℃下,采用雾化器喷雾热解技术在玻璃衬底上沉积薄膜。x射线衍射(XRD)分析表明,薄膜结构由六边形转变为四边形。高分辨率扫描电镜(HRSEM)研究表明,衬底被许多晶粒覆盖,表明平均晶粒尺寸为50-79 nm,结构紧凑。能量色散x射线分析(EDAX)揭示了原子百分率的平均比值。光学透射率研究表明,直接跃迁的存在。随着Sn含量的增加,带隙能量从3.33 eV降低到2.87 eV。薄膜的电阻率为106 Ω-m。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Structural, Optical and Electrical Properties of Thin Films Using Nebulizer Spray Pyrolysis Technique
thin films have been deposited on glass substrates at substrate temperature 400°C through nebulizer spray pyrolysis technique. X-ray diffraction (XRD) analysis shows that the films structure is changed from hexagonal to tetragonal. The high-resolution scanning electron microscopy (HRSEM) studies reveal that the substrate is well covered with a number of grains indicating compact morphology with an average grain size 50–79 nm. Energy dispersive X-ray analysis (EDAX) reveals the average ratio of the atomic percentage. Optical transmittance study shows the presence of direct transition. Band gap energy decreases from 3.33 to 2.87 eV with respect to the rise of Sn content. The electrical resistivity of the thin films was found to be 106 Ω-m.
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