镍磷电镀层的带状结构

C.C. Nee, R. Weil
{"title":"镍磷电镀层的带状结构","authors":"C.C. Nee,&nbsp;R. Weil","doi":"10.1016/0376-4583(85)90043-3","DOIUrl":null,"url":null,"abstract":"<div><p>The banded structure observed in metallographically polished and etched cross sections of Ni-P electrodeposits consisting of alternate dark and light layers parallel to the surface was investigated. The dark bands were attributed to a galvanic attack by the etchant at locations where the phosphorus content of the deposit changed relatively abruptly with thickness. A mechanism for the development of the compositional changes is proposed. Pulsed plating was found to eliminate the banded structure, but had little effect on the fracture strength and ductility.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"25 1","pages":"Pages 7-15"},"PeriodicalIF":0.0000,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90043-3","citationCount":"26","resultStr":"{\"title\":\"The banded structure of Ni-P electrodeposits\",\"authors\":\"C.C. Nee,&nbsp;R. Weil\",\"doi\":\"10.1016/0376-4583(85)90043-3\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>The banded structure observed in metallographically polished and etched cross sections of Ni-P electrodeposits consisting of alternate dark and light layers parallel to the surface was investigated. The dark bands were attributed to a galvanic attack by the etchant at locations where the phosphorus content of the deposit changed relatively abruptly with thickness. A mechanism for the development of the compositional changes is proposed. Pulsed plating was found to eliminate the banded structure, but had little effect on the fracture strength and ductility.</p></div>\",\"PeriodicalId\":22037,\"journal\":{\"name\":\"Surface Technology\",\"volume\":\"25 1\",\"pages\":\"Pages 7-15\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1985-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/0376-4583(85)90043-3\",\"citationCount\":\"26\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Surface Technology\",\"FirstCategoryId\":\"1087\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/0376458385900433\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface Technology","FirstCategoryId":"1087","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/0376458385900433","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 26

摘要

研究了平行于表面的暗层和亮层交替形成的Ni-P镀层的金相抛光和蚀刻截面上的带状结构。暗带是由于腐蚀剂在沉积物中磷含量随厚度变化相对突然的位置的电侵蚀造成的。提出了组分变化发生的机理。脉冲镀消除了带状组织,但对断裂强度和塑性影响不大。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The banded structure of Ni-P electrodeposits

The banded structure observed in metallographically polished and etched cross sections of Ni-P electrodeposits consisting of alternate dark and light layers parallel to the surface was investigated. The dark bands were attributed to a galvanic attack by the etchant at locations where the phosphorus content of the deposit changed relatively abruptly with thickness. A mechanism for the development of the compositional changes is proposed. Pulsed plating was found to eliminate the banded structure, but had little effect on the fracture strength and ductility.

求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信