碳前驱体掩膜在碳膜上产生可控穿孔的新方法

Macromol Pub Date : 2022-12-05 DOI:10.3390/macromol2040036
R. Rouhana, M. Stommel, M. Stanko, M. Muth
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引用次数: 1

摘要

采用化学掩蔽穿孔(CMP)的新方法,将线性低密度聚乙烯(LLDPE)制成图案碳膜。下面的文章描述了这一过程,首先用氯磺酸对前驱体聚合物LLDPE进行磺化以稳定材料,然后用傅里叶变换红外光谱(FTIR)评价来比较稳定膜和膜的屏蔽部分的原子键。最后,交联膜在950°C的烤箱中碳化。该工艺的结果是碳膜的厚度与直径为8 μ m的碳纤维相似,并且尺寸和分布可控。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Novel Method of Carbon Precursor Masking to Generate Controlled Perforations in a Carbon Film
A patterned carbon film was produced from Linear Low-Density Polyethylene (LLDPE) by the implementation of a novel method named Chemical Masking Perforation (CMP). The following paper describes this procedure, starting with the sulfonation of the precursor polymer LLDPE with Chlorosulphonic acid to stabilize the material, followed by Fourier-transform infrared spectroscopy (FTIR) evaluation to compare the atomic bonds from the stabilized film as well as from the masked sections of the film. To finalize, the cross-linked film was carbonized in an oven at 950 °C. The outcome of this process was a carbon film with a thickness similar to a carbon fiber diameter of 8 µm with controllable size and distribution.
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CiteScore
5.20
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