在45nm CMOS中使用可调谐环形振荡器的SRAM稳定性表征

Jason Tsai, S. Toh, Z. Guo, L. Pang, T. Liu, B. Nikolić
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引用次数: 18

摘要

SRAM产量通常通过静态读距或写距的分布来表征[1][2]。这些测量是模拟的,因此可能很慢,并提供有限的数据集。然而,每个电池最小工作电压的分布可以快速表征,并且通常作为静态噪声裕度的代表。这两种方法都有一个共同的局限性,即表征是静态完成的,因此忽略了可能影响动态操作的任何可能的影响。先前已经提出了用于评估SRAM单元读取时序的脉冲环形振荡器[3]。相比之下,可调环振荡器(RO)用于表征写入和读取操作期间的动态单元稳定性,而无需修改SRAM阵列。性能变化被捕获为RO工作频率的扩展,因此可以快速获得。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
SRAM stability characterization using tunable ring oscillators in 45nm CMOS
SRAM yield is often characterized through distributions of static read or write margins [1] [2]. These measurements are analog and therefore can be slow and provide a limited dataset. Distributions of per-cell minimum operating voltages can be characterized rapidly, however, and are often taken as a proxy to static noise margins. Both methods have a common limitation in that the characterization is done statically, thus ignoring any possible effects that may affect dynamic operation. Pulsed ring oscillators for evaluating SRAM cell read timing have been previously proposed [3]. In contrast, tunable ring oscillators (RO) for characterizing dynamic cell stability during write and read operations without the need to modify the SRAM array are demonstrated in this work. The performance variation is captured as a spread in RO operating frequencies and therefore can be obtained rapidly.
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