离子辐照对GaP中相干光学声子消相的影响

Takuto Ichikawa, Y. Saito, M. Hase
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引用次数: 0

摘要

利用基于电光采样的飞秒泵浦探测技术研究了离子辐照GaP中相干纵向光学声子的消相现象。研究发现,在砷离子辐照下,少量缺陷的引入大大延长了相干LO声子的消相时间。当Ga$^{+}$离子剂量为10$^{13}$/cm$^{2}$时,在室温下观察到的最大失相时间为9.1 ps,明显大于离子辐照前GaP的8.3 ps。较长的消相时间是由缺陷诱导的深能级抑制电子- lo -声子散射来解释的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The effect of ion irradiation on dephasing of coherent optical phonons in GaP
The dephasing of coherent longitudinal optical (LO) phonons in ion-irradiated GaP has been investigated with a femtosecond pump-probe technique based on electro-optic sampling. The dephasing time of the coherent LO phonon is found to be dramatically prolonged by the introduction of a small amount of defects by means of Ga-ion irradiation. The maximum dephasing time observed at room temperature is 9.1 ps at a Ga$^{+}$ ion dose of 10$^{13}$/cm$^{2}$, which is significantly longer than the value of 8.3 ps for GaP before ion irradiation. The longer dephasing time is explained in terms of the suppression of electron-LO-phonon scattering by the presence of defect-induced deep levels.
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