Geant4在具有Si纳米线界面的Sn基体中声子传导的蒙特卡罗模拟研究中的有效性

C. Iheduru, M. Eleruja, B. Olofinjana, O. E. Awe, A. Buba
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引用次数: 0

摘要

摘要利用Geant4模拟具有Si纳米线界面的Sn宿主体内的声子传导,探讨了其有效性。我们的蒙特卡罗模拟表明,当系统达到100个时间步长的稳态时,声子传导Geant4模拟的有效性增加。我们利用Geant4Condensed Matter Physics蒙特卡罗模拟工具包,在低成本、低功能的处理计算机上模拟了具有Si纳米线界面的Sn主机中的声子传导。在模拟中,声子在给定的速度和方向矢量的作用下从其初始位置在计算域中移位。选择一个时间步长,使声子在一个时间步长内最多移动一个子单元的长度。我们利用Geant4对SiSn基合金的声子传导进行了分析,结果表明SiSn基合金的声子传导性能得到了提高,预测的热值也较为合理。热剖面模拟的数值预测结果均在硅锡平均温度的10%以内。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effectiveness of Geant4 in Monte Carlo Simulation Studyofphonon Conduction in Sn Host with Si Nanowire Interface
Abstract We have explored the effectiveness of Geant4 by using it to simulate phonon conduction in Sn Host with Si Nanowire Interface. Our Monte Carlo Simulation shows that the effectiveness of the phonon conduction Geant4 simulation increases when the system attained a steady state of 100 time steps. We have simulated phonon conduction in Sn host with Si nanowire interface using a Geant4Condensed Matter Physics Monte Carlo simulation toolkit in a low cost and less powerful processing computer machine. In the simulation, phonons were displaced inside a computation domain from their initial positions with the velocities and direction vectors assigned to them. A time step was selected so that a phonon can move at most the length of one sub-cell in one time step. Our phonon conduction analysis of SiSn based alloy using Geant4 showed performance enhancement and reasonable predicted thermal values. Numerical predictions of the thermal profile simulations of the values of the temperature in each cell were all within ten percent of the average temperature of Silicon – Tin.
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