倾斜沉积法控制碲化锑热电薄膜的晶体取向

T. Shimojo, Y. Sasaki, M. Takashiri
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引用次数: 0

摘要

我们在0º~ 80º的入射角范围内采用斜沉积法制备了p型碲化锑薄膜。我们研究了薄膜的结构和电学性能之间的关系。通过扫描电镜(SEM)和x射线衍射(XRD)分析了晶体的取向和晶粒尺寸。电学性能方面,我们测量了室温下的面内电导率、塞贝克系数和功率因数。结果表明,当入射角为40°时,薄膜的晶体取向最高。随着入射角的增大,晶体尺寸增大,功率因数减小。入射角度为0°时,薄膜的功率因数为1.26 μW / (cm·K 2),入射角度为80°时,薄膜的功率因数为0.38 μW / (cm·K 2)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Crystal orientation control of antimony telluride thermoelectric thin films by oblique deposition
We prepared p-type antimony telluride thin films by an oblique deposition at the incident angle ranging from 0º to 80º. We investigated the relationship between the structural and electrical properties of the thin films. As the structural properties, we analyzed cross-section morphology by scanning electron microscope (SEM), and the crystal orientation and crystallite size by x-ray diffraction (XRD) analysis. As the electrical properties, we measured in-plane electrical conductivity, Seebeck coefficient and power factor at room temperature. As a result, we found the thin film at the incident angle of 40° obtained the highest crystal orientation. As the incident angle increased, the crystallite size were enhanced but the power factor decreased. The power factor of thin film at the incident angle of 0° was 1.26 μW / ( cm · K 2 ) and thin film at the incident angle of 80° was 0.38 μW / ( cm · K 2 ).
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