A. Zykov, N. Yefymenko, V. Korneenkov, S. Dudin, S. Yakovin
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The Energy and Ion Flux Control in MISSS for Nanostructure Coating Synthesis
The paper presents characteristics of combined Magnetron-Ion-Source Sputtering System (MISSS) with impact on the joint operation of magnetron discharge the ion source giving detailed dependencies of the system parameters on gas pressure, magnetic field strength and topology, and input power. Spatial distribution of particle fluxes and ion energy spectra in different operating modes of the system are presented as well.