光刻技术制备二氧化硅包层有源和无源光子晶体纳米腔器件:面向光子晶体纳米腔器件量产的未来

2017 Conference on Lasers and Electro-Optics Pacific Rim (CLEO-PR) Pub Date : 2017-11-22 DOI:10.1109/CLEOPR.2017.8119006

Nurul Ashikin Binti Daud, Y. Ooka, T. Tabata, T. Tetsumoto, T. Tanabe

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引用次数: 2

摘要

我们描述了无源和有源光子晶体纳米腔器件的制造和演示，即电光调制器，全硅光电探测器和DeMUX滤波器。这是用光刻工艺制造的有源和无源光子晶体纳米腔器件的首次演示，可能导致未来的大规模生产。

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SiO2 clad active and passive photonic crystal nanocavity devices fabricated with photolithography: Toward future mass production of photonic crystal nanocavity devices

We describe the fabrication and a demonstration of passive and active photonic crystal nanocavity devices, namely an electro-optic modulator, an all-silicon photodetector and a DeMUX filter. This is the first demonstration of active and passive photonic crystal nanocavity devices fabricated with a photolithographic process that may lead to future mass production.

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来源期刊

2017 Conference on Lasers and Electro-Optics Pacific Rim (CLEO-PR)

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