对一步溅射黄铜矿CIGS薄膜无影响

Tzu‐Ying Lin, Chia-Hsiang Chen, C. Lai
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引用次数: 2

摘要

在本研究中,我们研究了工作压力对钼(Mo)薄膜性能的影响,以及Mo背接触对一步溅射法制备的黄铜矿Cu(In,Ga)Se2 (CIGS)薄膜的影响。讨论了表面形貌、晶体结构和残余应力的性质。在低工作压力下溅射的Mo膜具有致密的压应力结构,在高工作压力下溅射的Mo膜具有多孔的拉应力。此外,后续沉积的CIGS薄膜的择优取向与Mo背接触残余应力有很强的相关性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Mo effect on one-step sputtering chalcopyrite CIGS thin films
In this study, we have investigated the working pressure effect on the properties of molybdenum (Mo) films and how the Mo back contact affects the chalcopyrite Cu(In,Ga)Se2 (CIGS) films, which are prepared by one-step sputtering process. The properties of surface morphology, crystalline structure and residual stress are discussed. Mo films sputtered at low working pressure have dense structure with compressive stress, and become porous with tensile stress at high working pressure. In addition, the preferred orientation of following deposited CIGS film shows strong correlation with the residual stress of Mo back contact.
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