纯In2O3和掺杂锡的电子结构研究

Samir F Matar , Antoine Villesuzanne , Guy Campet , Josik Portier , Youssef Saikali
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引用次数: 1

摘要

利用从头算局域密度泛函理论和非自一致扩展h ckel方法研究了倍半氧化物In2O3和掺锡In2O3的电子结构。在未掺杂的情况下,获得了直接带隙和导带底部的宽色散。在掺杂的情况下,在导带的底部发现了一个狭窄的、半填充的Sn带,这与实验观察到的金属和透明特性一致。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Étude des structures électroniques de In2O3 pur et dopé avec l’étain

The electronic structures of the sesquioxide In2O3 and Sn-doped In2O3 are examined both self-consistently within the ab initio local density functional theory and using the non self-consistent extended Hückel method. A direct band gap and a wide dispersion of the bottom of the conduction band are obtained in the non-doped case. In the doped case, a narrow, half-filled band assigned to Sn is found at the bottom of the conduction band, in agreement with the metallic and transparent characteristics observed experimentally.

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