纳米表面误差光学平面镜的制备

张. Z. Feng
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引用次数: 0

摘要

为了有效地抛光具有纳米表面误差的光学平面镜,提出了一种由传统连续抛光(CP)和先进离子束整形(IBF)组成的新型抛光技术。介绍了CP和IBF的抛光原理。研究了IBF的抛光实验和材料去除功能。采用组合抛光技术对Ф150 mm光学平面镜进行抛光。经抛光后,平面镜的表面误差和粗糙度均为1。RMS为217nm, RMS为217nm。RMS分别为506 nm。实验结果表明,复合抛光技术可有效抛光纳米级表面误差光学平面镜。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fabrication of optical flat mirror with nanometer surface error
In order to polish optical flat mirror with nanometer surface error efficiently,a consisting of new polishing technology traditional continuous polishing( CP) and advanced ion beam figuring( IBF) is presented in this paper. The polishing principles of CP and IBF are introduced. The polishing experiment and material removal function of IBF are studied. A Ф150 mm optical flat mirror is polished by the combined polishing technology. After polishing,the surface error and roughness of the flat mirror are 1. 217 nm RMS and0. 506 nm RMS,respectively. The experiment results indicate that the combined polishing technology is effective for polishing optical flat mirror with nanometer surface error.
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