基于条件的腔室清洗操作集群工具调度多智能体强化学习方法

Cheolhui Hong, Tae-Eog Lee
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引用次数: 9

摘要

为了提高半导体的性能,制造商大幅缩小晶圆电路的宽度。这就增加了晶圆制造过程中质量控制的重要性。因此,最近的晶圆厂倾向于在每个预定的时间内清洗每个腔室,以去除腔室中的化学残留物和热量。这种腔室清洗工艺可以提高晶圆质量,但降低了生产效率。因此,根据清洗周期的不同,晶圆片的质量和生产率存在权衡关系。在本文中,我们提出了一种新的清洗工艺,基于条件的清洗,旨在最大限度地提高生产率,同时保持晶圆片的质量。然后,我们提出了一种基于多智能体强化学习的调度集群工具的方法。最后,我们通过实验验证了我们的算法在基于条件的清洗下比现有序列具有更高的性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Multi-agent Reinforcement Learning Approach for Scheduling Cluster Tools with Condition Based Chamber Cleaning Operations
To improve the performance of semiconductors, manufacturers shrink the wafer circuit width dramatically. This increases the importance of quality control during wafer fabrication process. Thus, fabs recently tend to clean each chamber for every predetermined period to remove chemical residues and heat in the chamber. Such a chamber cleaning process can improve the quality of wafers, but the productivity is lowered. Therefore, the quality and the productivity of wafers have trade-off relations according to the cleaning period. In this paper, we propose a new class of cleaning process, condition based cleaning, which aims to maximize productivity while maintaining wafers quality. We then propose a way to find scheduling cluster tools based on multi-agent reinforcement learning. Finally, we experimentally verify that our algorithm can archive higher performance than existing sequences, under condition-based cleaning.
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