用Chevron微通道表征阳极键合的力学特性

David C. Woodrum, M. Nasr, Xuchen Zhang, M. Bakir, S. Sitaraman
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引用次数: 1

摘要

随着微电子器件的功率需求不断上升,新的散热技术需要创新的制造解决方案,如片上冷却方法。这些大功率高压系统的机械可靠性对微电子结构中的界面强度特别敏感。在佐治亚理工学院的研究中,芯片上的冷却方法包括通过微通道泵送高压冷却剂来冷却设备。微通道直接蚀刻在硅片上,然后用第二层耐热玻璃覆盖。当流体流经系统时,微通道某些位置的内压可超过2000kpa。考虑到潜在的灾难性裂纹扩展,脆性材料开裂引起的整体系统失效尤其令人感兴趣。采用实验和建模相结合的方法,提出了一种预测硅-玻璃键合微通道系统界面和内聚强度的方法。这项工作的目的是证明实验测试技术的结果,并结合断裂条件的数值模拟提取适当的硅-玻璃界面测试数据。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Mechanical Characterization of Anodic Bonding Using Chevron Microchannel
As power demands for microelectronic devices continue to rise, new techniques for heat dissipation require innovative fabrication solutions such as on-chip cooling methods. The mechanical reliability of these high-powered, high-pressure systems is particularly sensitive to the interfacial strengths within the microelectronic architectures. In research at Georgia Tech, on-chip cooling methodologies involve cooling of devices with high-pressure coolant which is pumped through a microchannel. The microchannels are etched directly into a silicon wafer and then capped by a second wafer of pyrex glass. When fluid flows through the system, internal pressures can exceed 2000 kPa in certain locations of the microchannel. Overall system failure due to cracking of the brittle materials is of particular interest given the potential for catastrophic crack propagation. Using a combination of experiments and modeling, a methodology for predicting interfacial and cohesive strength of the silicon-glass bonded microchannel system has been developed. The objective of this work is to demonstrate the results of the experimental test technique and to extract appropriate silicon-glass interfacial test data in conjunction with numerical modeling of the fracture conditions.
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