多晶硅中Si-C-N纵向沉淀的结构分析

S. Kostner, A. Hahnel, R. Mokso, H. Blumtritt, P. Werner
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引用次数: 0

摘要

在多晶硅结晶过程中,富碳的液固相边界层出现,导致n型导电Si-C-N细丝的析出。我们提出了一个深入的结构分析不同类型的细丝,以支持其生长的建模。相对比显微断层扫描低至亚微米水平,用于研究形态和沉淀的播种,同时仍然嵌入在功能齐全的太阳能电池样品中。详细的透射电镜分析和定量的电子能量损失谱分析,提出了基于层析辅助靶制备。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Structural analysis of longitudinal Si-C-N precipitates in multicrystalline silicon
During crystallization of multicrystalline silicon, carbon-rich liquid-solid phase-boundary layers appear, resulting in precipitation of n-type conductive Si-C-N filaments.We present an in-depth structural analysis of distinct types of filaments to support modeling of their growth. Phase-contrast microtomography down to the submicron level is used to study morphology and seeding of precipitates while still embedded in fully functional solar cell samples. A detailed transmission electron microscopy analysis and a quantitative electron energy loss spectroscopy analysis are presented, based on tomography-assisted target preparation.
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