D. Wendel, R. Kalla, Robert Cargnoni, J. Clabes, J. Friedrich, R. Frech, J. Kahle, B. Sinharoy, William J. Starke, Scott A. Taylor, S. Weitzel, S. Chu, M. S. Islam, V. Zyuban
{"title":"POWER7TM的实现:一个高度并行和可伸缩的多核高端服务器处理器","authors":"D. Wendel, R. Kalla, Robert Cargnoni, J. Clabes, J. Friedrich, R. Frech, J. Kahle, B. Sinharoy, William J. Starke, Scott A. Taylor, S. Weitzel, S. Chu, M. S. Islam, V. Zyuban","doi":"10.1109/ISSCC.2010.5434074","DOIUrl":null,"url":null,"abstract":"The next processor of the POWER ™ family, called POWER7™ is introduced. Eight quad-threaded cores are integrated together with two memory controllers and high-speed system links on a 567mm2 die, employing 1.2B transistors in 45nm CMOS SOI technology [4]. High on-chip performance and therefore bandwidth is achieved using 11 layers of low-к copper wiring and devices with enhanced dual-stress liners. The technology features deep trench [DT] capacitors that are used to build the 32MB embedded DRAM L3 based on a 0.067µm2 DRAM cell. DT capacitors are used also to reduce on-chip voltage-island supply noise. Focusing on speed, the dual-supply ripple-domino SRAM concepts follows the schemes described elsewhere.","PeriodicalId":6418,"journal":{"name":"2010 IEEE International Solid-State Circuits Conference - (ISSCC)","volume":"1 1","pages":"102-103"},"PeriodicalIF":0.0000,"publicationDate":"2010-03-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"83","resultStr":"{\"title\":\"The implementation of POWER7TM: A highly parallel and scalable multi-core high-end server processor\",\"authors\":\"D. Wendel, R. Kalla, Robert Cargnoni, J. Clabes, J. Friedrich, R. Frech, J. Kahle, B. Sinharoy, William J. Starke, Scott A. Taylor, S. Weitzel, S. Chu, M. S. Islam, V. Zyuban\",\"doi\":\"10.1109/ISSCC.2010.5434074\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The next processor of the POWER ™ family, called POWER7™ is introduced. Eight quad-threaded cores are integrated together with two memory controllers and high-speed system links on a 567mm2 die, employing 1.2B transistors in 45nm CMOS SOI technology [4]. High on-chip performance and therefore bandwidth is achieved using 11 layers of low-к copper wiring and devices with enhanced dual-stress liners. The technology features deep trench [DT] capacitors that are used to build the 32MB embedded DRAM L3 based on a 0.067µm2 DRAM cell. DT capacitors are used also to reduce on-chip voltage-island supply noise. Focusing on speed, the dual-supply ripple-domino SRAM concepts follows the schemes described elsewhere.\",\"PeriodicalId\":6418,\"journal\":{\"name\":\"2010 IEEE International Solid-State Circuits Conference - (ISSCC)\",\"volume\":\"1 1\",\"pages\":\"102-103\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-03-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"83\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 IEEE International Solid-State Circuits Conference - (ISSCC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSCC.2010.5434074\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 IEEE International Solid-State Circuits Conference - (ISSCC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSCC.2010.5434074","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The implementation of POWER7TM: A highly parallel and scalable multi-core high-end server processor
The next processor of the POWER ™ family, called POWER7™ is introduced. Eight quad-threaded cores are integrated together with two memory controllers and high-speed system links on a 567mm2 die, employing 1.2B transistors in 45nm CMOS SOI technology [4]. High on-chip performance and therefore bandwidth is achieved using 11 layers of low-к copper wiring and devices with enhanced dual-stress liners. The technology features deep trench [DT] capacitors that are used to build the 32MB embedded DRAM L3 based on a 0.067µm2 DRAM cell. DT capacitors are used also to reduce on-chip voltage-island supply noise. Focusing on speed, the dual-supply ripple-domino SRAM concepts follows the schemes described elsewhere.