Jihoon Jeong, Francois Atallah, Hoan Nguyen, Josh Puckett, K. Bowman, David Hansquine
{"title":"一个16nm可配置的通栅位单元寄存器文件,用于量化pet与net通栅位单元的VMIN优势","authors":"Jihoon Jeong, Francois Atallah, Hoan Nguyen, Josh Puckett, K. Bowman, David Hansquine","doi":"10.1109/CICC.2015.7338444","DOIUrl":null,"url":null,"abstract":"A 16nm configurable pass-gate bit-cell register file allows a direct comparison of NFET versus PFET pass-gate bit cells for early technology evaluation. The configurable pass gate enables either a transmission-gate (TG), an NFET pass gate, or a PFET pass gate. From silicon test-chip measurement, the register file with PFET pass-gate bit cells achieves a 33% minimum supply voltage (VMIN) reduction in a 16nm FinFET technology and a 40% VMIN reduction in an enhanced 16nm FinFET technology as compared to a register file with NFET pass-gate bit cells. Test-chip measurements highlight the superior benefits of the PFET drive current relative to the NFET drive current at low voltages. The VMIN improvement with a PFET pass-gate bit cell represents a paradigm-shift from traditional CMOS circuit-design practices.","PeriodicalId":6665,"journal":{"name":"2015 IEEE Custom Integrated Circuits Conference (CICC)","volume":"77 1","pages":"1-4"},"PeriodicalIF":0.0000,"publicationDate":"2015-11-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"A 16nm configurable pass-gate bit-cell register file for quantifying the VMIN advantage of PFET versus NFET pass-gate bit cells\",\"authors\":\"Jihoon Jeong, Francois Atallah, Hoan Nguyen, Josh Puckett, K. Bowman, David Hansquine\",\"doi\":\"10.1109/CICC.2015.7338444\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A 16nm configurable pass-gate bit-cell register file allows a direct comparison of NFET versus PFET pass-gate bit cells for early technology evaluation. The configurable pass gate enables either a transmission-gate (TG), an NFET pass gate, or a PFET pass gate. From silicon test-chip measurement, the register file with PFET pass-gate bit cells achieves a 33% minimum supply voltage (VMIN) reduction in a 16nm FinFET technology and a 40% VMIN reduction in an enhanced 16nm FinFET technology as compared to a register file with NFET pass-gate bit cells. Test-chip measurements highlight the superior benefits of the PFET drive current relative to the NFET drive current at low voltages. The VMIN improvement with a PFET pass-gate bit cell represents a paradigm-shift from traditional CMOS circuit-design practices.\",\"PeriodicalId\":6665,\"journal\":{\"name\":\"2015 IEEE Custom Integrated Circuits Conference (CICC)\",\"volume\":\"77 1\",\"pages\":\"1-4\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-11-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2015 IEEE Custom Integrated Circuits Conference (CICC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CICC.2015.7338444\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 IEEE Custom Integrated Circuits Conference (CICC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CICC.2015.7338444","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A 16nm configurable pass-gate bit-cell register file for quantifying the VMIN advantage of PFET versus NFET pass-gate bit cells
A 16nm configurable pass-gate bit-cell register file allows a direct comparison of NFET versus PFET pass-gate bit cells for early technology evaluation. The configurable pass gate enables either a transmission-gate (TG), an NFET pass gate, or a PFET pass gate. From silicon test-chip measurement, the register file with PFET pass-gate bit cells achieves a 33% minimum supply voltage (VMIN) reduction in a 16nm FinFET technology and a 40% VMIN reduction in an enhanced 16nm FinFET technology as compared to a register file with NFET pass-gate bit cells. Test-chip measurements highlight the superior benefits of the PFET drive current relative to the NFET drive current at low voltages. The VMIN improvement with a PFET pass-gate bit cell represents a paradigm-shift from traditional CMOS circuit-design practices.