А.А. Ломов, Д.М. Захаров, Михаил Александрович Тарасов, А. М. Чекушкин, А. А. Татаринцев, Данила Алексеевич Киселёв, Т.C. Ильина, А Е Селезнев
{"title":"同缓冲层对形态、微结构和Al/Si胶片强度的影响(111)","authors":"А.А. Ломов, Д.М. Захаров, Михаил Александрович Тарасов, А. М. Чекушкин, А. А. Татаринцев, Данила Алексеевич Киселёв, Т.C. Ильина, А Е Селезнев","doi":"10.21883/jtf.2023.07.55743.83-23","DOIUrl":null,"url":null,"abstract":"The results of complementary studies of Al films grown by magnetron sputtering at room temperature are presented. The films were obtained on standard Si(111) silicon substrates without and with a ~20 nm aluminum (homobuffer) layer preliminarily grown on their surface at 400°C. The interdependence of the morphology, microstructure, and hardness of Al films on the state of the substrate surface was studied by the HRXRR, XRD, SEM, EDS, AFM, and Nano Indenter (ASTM) methods. It is shown that the formation of homobuffer layers on the substrate surface makes it possible to control the structural and mechanical properties of thin aluminum films.","PeriodicalId":24036,"journal":{"name":"Журнал технической физики","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2023-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Влияние гомобуферного слоя на морфологию, микроструктуру и твердость пленок Al/Si(111)\",\"authors\":\"А.А. Ломов, Д.М. Захаров, Михаил Александрович Тарасов, А. М. Чекушкин, А. А. Татаринцев, Данила Алексеевич Киселёв, Т.C. Ильина, А Е Селезнев\",\"doi\":\"10.21883/jtf.2023.07.55743.83-23\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The results of complementary studies of Al films grown by magnetron sputtering at room temperature are presented. The films were obtained on standard Si(111) silicon substrates without and with a ~20 nm aluminum (homobuffer) layer preliminarily grown on their surface at 400°C. The interdependence of the morphology, microstructure, and hardness of Al films on the state of the substrate surface was studied by the HRXRR, XRD, SEM, EDS, AFM, and Nano Indenter (ASTM) methods. It is shown that the formation of homobuffer layers on the substrate surface makes it possible to control the structural and mechanical properties of thin aluminum films.\",\"PeriodicalId\":24036,\"journal\":{\"name\":\"Журнал технической физики\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Журнал технической физики\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.21883/jtf.2023.07.55743.83-23\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Журнал технической физики","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.21883/jtf.2023.07.55743.83-23","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Влияние гомобуферного слоя на морфологию, микроструктуру и твердость пленок Al/Si(111)
The results of complementary studies of Al films grown by magnetron sputtering at room temperature are presented. The films were obtained on standard Si(111) silicon substrates without and with a ~20 nm aluminum (homobuffer) layer preliminarily grown on their surface at 400°C. The interdependence of the morphology, microstructure, and hardness of Al films on the state of the substrate surface was studied by the HRXRR, XRD, SEM, EDS, AFM, and Nano Indenter (ASTM) methods. It is shown that the formation of homobuffer layers on the substrate surface makes it possible to control the structural and mechanical properties of thin aluminum films.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
