{"title":"以氯化物为基础的熔盐中的电解镀铝","authors":"M. Paučírová, K. Matiašovský","doi":"10.1016/0300-9416(75)90051-6","DOIUrl":null,"url":null,"abstract":"<div><p>Electrolytic aluminium-plating of iron bases in fused salts based on chlorides was investigated. As base electrolytes, the ternary AlCl<sub>3</sub>-NaCl- KCl mixtures containing 76–80 wt.% AlCl<sub>3</sub> and 20–24 wt.% of NaCl and KCl in the ratio of 1:1 were found to be the most effective. The quality of the deposited Al layer was further improved by an addition of 5 wt.% NaI. The best results were obtained in the temperature range 150–200°C with a cathodic current density of up to 7 A dm<sup>-2</sup>. Under these conditions, aluminum was deposited in the form of a fine-crystalline, silver-bright and non-porous layer.</p></div>","PeriodicalId":100399,"journal":{"name":"Electrodeposition and Surface Treatment","volume":"3 2","pages":"Pages 121-128"},"PeriodicalIF":0.0000,"publicationDate":"1975-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0300-9416(75)90051-6","citationCount":"12","resultStr":"{\"title\":\"Electrolytic aluminium-plating in fused salts based on chlorides\",\"authors\":\"M. Paučírová, K. Matiašovský\",\"doi\":\"10.1016/0300-9416(75)90051-6\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Electrolytic aluminium-plating of iron bases in fused salts based on chlorides was investigated. As base electrolytes, the ternary AlCl<sub>3</sub>-NaCl- KCl mixtures containing 76–80 wt.% AlCl<sub>3</sub> and 20–24 wt.% of NaCl and KCl in the ratio of 1:1 were found to be the most effective. The quality of the deposited Al layer was further improved by an addition of 5 wt.% NaI. The best results were obtained in the temperature range 150–200°C with a cathodic current density of up to 7 A dm<sup>-2</sup>. Under these conditions, aluminum was deposited in the form of a fine-crystalline, silver-bright and non-porous layer.</p></div>\",\"PeriodicalId\":100399,\"journal\":{\"name\":\"Electrodeposition and Surface Treatment\",\"volume\":\"3 2\",\"pages\":\"Pages 121-128\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1975-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/0300-9416(75)90051-6\",\"citationCount\":\"12\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Electrodeposition and Surface Treatment\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/0300941675900516\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electrodeposition and Surface Treatment","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/0300941675900516","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Electrolytic aluminium-plating in fused salts based on chlorides
Electrolytic aluminium-plating of iron bases in fused salts based on chlorides was investigated. As base electrolytes, the ternary AlCl3-NaCl- KCl mixtures containing 76–80 wt.% AlCl3 and 20–24 wt.% of NaCl and KCl in the ratio of 1:1 were found to be the most effective. The quality of the deposited Al layer was further improved by an addition of 5 wt.% NaI. The best results were obtained in the temperature range 150–200°C with a cathodic current density of up to 7 A dm-2. Under these conditions, aluminum was deposited in the form of a fine-crystalline, silver-bright and non-porous layer.
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