In2O3薄膜气体传感器的阻抗谱分析

C. Mariappan, E. Prabhu, K. I. Gnanasekar, V. Jayaraman, T. Gnanasekaran
{"title":"In2O3薄膜气体传感器的阻抗谱分析","authors":"C. Mariappan, E. Prabhu, K. I. Gnanasekar, V. Jayaraman, T. Gnanasekaran","doi":"10.1109/ISPTS.2012.6260922","DOIUrl":null,"url":null,"abstract":"In<inf>2</inf>O<inf>3</inf> thin film was fabricated using pulsed laser deposition technique. The structure and morphology of the thin film were characterized by X-ray diffraction and atomic force microscopy respectively. AC impedance of In<inf>2</inf>O<inf>3</inf> thin film gas sensor were investigated at different temperatures (275 – 425 °C) when exposed into clean air and air containing NO<inf>x</inf>. Significant NO<inf>x</inf> sensing characteristics of thin film were observed at 325 °C by ac impedance analysis. The resistance and capacitance of indium oxide film were increased in the presence of NO<inf>x</inf>. The mechanism for the increase of resistance and of capacitance is presented.","PeriodicalId":6431,"journal":{"name":"2012 1st International Symposium on Physics and Technology of Sensors (ISPTS-1)","volume":"94 1","pages":"200-203"},"PeriodicalIF":0.0000,"publicationDate":"2012-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Impedance spectroscopy analysis of In2O3 thin film gas sensor\",\"authors\":\"C. Mariappan, E. Prabhu, K. I. Gnanasekar, V. Jayaraman, T. Gnanasekaran\",\"doi\":\"10.1109/ISPTS.2012.6260922\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In<inf>2</inf>O<inf>3</inf> thin film was fabricated using pulsed laser deposition technique. The structure and morphology of the thin film were characterized by X-ray diffraction and atomic force microscopy respectively. AC impedance of In<inf>2</inf>O<inf>3</inf> thin film gas sensor were investigated at different temperatures (275 – 425 °C) when exposed into clean air and air containing NO<inf>x</inf>. Significant NO<inf>x</inf> sensing characteristics of thin film were observed at 325 °C by ac impedance analysis. The resistance and capacitance of indium oxide film were increased in the presence of NO<inf>x</inf>. The mechanism for the increase of resistance and of capacitance is presented.\",\"PeriodicalId\":6431,\"journal\":{\"name\":\"2012 1st International Symposium on Physics and Technology of Sensors (ISPTS-1)\",\"volume\":\"94 1\",\"pages\":\"200-203\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-03-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2012 1st International Symposium on Physics and Technology of Sensors (ISPTS-1)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISPTS.2012.6260922\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 1st International Symposium on Physics and Technology of Sensors (ISPTS-1)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPTS.2012.6260922","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

采用脉冲激光沉积技术制备了In2O3薄膜。用x射线衍射和原子力显微镜对薄膜的结构和形貌进行了表征。研究了不同温度下(275 ~ 425℃)暴露在洁净空气和含NOx空气中的In2O3薄膜气体传感器的交流阻抗。通过交流阻抗分析,发现薄膜在325°C时具有明显的NOx感应特性。在NOx的存在下,氧化铟膜的电阻和电容量均有所增加。给出了电阻和电容增大的机理。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Impedance spectroscopy analysis of In2O3 thin film gas sensor
In2O3 thin film was fabricated using pulsed laser deposition technique. The structure and morphology of the thin film were characterized by X-ray diffraction and atomic force microscopy respectively. AC impedance of In2O3 thin film gas sensor were investigated at different temperatures (275 – 425 °C) when exposed into clean air and air containing NOx. Significant NOx sensing characteristics of thin film were observed at 325 °C by ac impedance analysis. The resistance and capacitance of indium oxide film were increased in the presence of NOx. The mechanism for the increase of resistance and of capacitance is presented.
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