用SNMS、XPS、TDS和TRFA分析SiO2表面溅射沉积和蒸发氧化钽层

{"title":"用SNMS、XPS、TDS和TRFA分析SiO2表面溅射沉积和蒸发氧化钽层","authors":"K. Müller, V. Rupertus, H. Oechsner, V. Scheuer, T. Tschudi","doi":"10.1007/BF00572362","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":12372,"journal":{"name":"Fresenius' Zeitschrift für analytische Chemie","volume":"9 1","pages":"498-501"},"PeriodicalIF":0.0000,"publicationDate":"1989-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"Analysis of sputter deposited and evaporated tantalum oxide layers on SiO2 by SNMS, XPS, TDS and TRFA\",\"authors\":\"K. Müller, V. Rupertus, H. Oechsner, V. Scheuer, T. Tschudi\",\"doi\":\"10.1007/BF00572362\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":12372,\"journal\":{\"name\":\"Fresenius' Zeitschrift für analytische Chemie\",\"volume\":\"9 1\",\"pages\":\"498-501\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1989-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Fresenius' Zeitschrift für analytische Chemie\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1007/BF00572362\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Fresenius' Zeitschrift für analytische Chemie","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1007/BF00572362","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}