富氢水生产工艺技术及高负氧化还原电位表征水

Edward Reszke, Grzegorz Binkiewicz, G. Schroeder
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引用次数: 0

摘要

介绍了等离子体反应器的结构和制备富氢负氧化电位水的工艺过程。利用非等离子体技术,在反应器容器或玻璃瓶中对氢气进行水饱和,获得了富氢水。我们开发了一种等离子体流动反应器,该反应器允许非接触式微结构,并通过共振随机振动放大水中选定的化合物,在等离子体放电过程中产生频率从100 Hz到50 MHz的宽带电磁噪声,来改变水/水溶液的性质。然后,这些水在反应器或玻璃瓶中被氢气饱和。在反应器中得到的水具有高浓度氢(8 mg/L)和负氧化还原电位(ORP)值(-450 mV)的特点。在该工艺中,在20℃的温度下,1m3的水箱中氢气使水饱和的过程大约需要30分钟。在获得瓶中ORP电位为负的水的技术中,用氢气使水饱和的过程只需要5-10秒。用这种技术在玻璃瓶中获得的水在24小时后不含太多氢气,即使在三个月的时间里,其ORP值也在-380 mV左右。只有当水受到等离子体放电过程中产生的频率从100 Hz到50 MHz的宽带电磁噪声的影响时,才有可能获得具有上述参数的水。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Process Technology for Production of Hydrogen-Rich Water and Water Characterizing by Highly Negative Oxidation Reduction Potential
The construction of plasma reactors and the technological process of obtaining water rich in hydrogen and characterized by a negative oxidation potential are presented in the publication. Hydrogen-rich water was obtained based on non-plasma technology and water saturation with hydrogen gas in a reactor vessel or in glass bottles. We have developed a plasma flow reactor that allows for contactless microstructuring and modifying the properties of water / aqueous solutions by resonant stochastic vibration amplification of selected chemical compounds in water with broadband electromagnetic noise with frequencies ranging from 100 Hz to 50 MHz generated during plasma discharge. This water is then saturated with hydrogen gas in the reactor or in glass bottles. The water obtained in the reactor is characterized by a high concentration of hydrogen (8 mg/L) and a negative oxidation-reduction potential (ORP) value (-450 mV). In this technology, the process of saturating water with hydrogen in a 1 m3 tank at a temperature of 20oC takes about 30 minutes. In the technology of obtaining water with negative ORP potential in the bottles, the process of saturating the water with hydrogen lasts only 5-10 seconds. Water obtained with such technology in the glass bottles does not contain much hydrogen gas after 24 hours, while it is characterized by a negative ORP value of about -380 mV even for a period of three months. Obtaining water with presented parameters is possible only in the case of water subjected to the influence of broadband electromagnetic noise with frequencies ranging from 100 Hz to 50 MHz generated during plasma discharge.
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