非晶Cu-Ti填充金属连接氮化硅(材料、冶金及可焊性)

M. Naka, Tasuku Tanaka, I. Okamoto
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引用次数: 9

摘要

采用Cu66Ti34、Cu50Ti50和Cu43Ti57三种非晶填充金属制备Si3N4/Si3N4接头,其中采用无压烧结的Si3N4。采用断裂剪切试验测定了Si3N4接头的连接强度,采用SEM显微组织观察和EDX、EPMA分析了接头的连接机理。结果表明:(1)含钛量在20%以上的Cu-Ti合金熔液的平衡接触角约为8°,适用于Si3N4的连接。(2)在除1273 K外的任何钎焊温度下,使用Cu66Ti34钎料的Si3N4的连接强度都高于使用其他Cu-Ti钎料的Si3N4。因此,在1323 K的钎焊温度下,Si3N4与Cu66Ti34钎料的连接强度达到最大值313.8 MPa。当钎焊温度为1373 K时,钎料Cu50Ti50的Si3N4接头在钎焊时间为1.8 K时的峰值为176.5 MPa,随着钎焊时间的延长逐渐降低,在钎焊时间为7.2 K时为19.6 MPa。Cu50Ti50钎料在1373 K下钎焊1.8 K时,Si3N4接头的高温断裂抗剪强度在373 K时增加到199.1 MPa,在973 K时逐渐降低到105.9 MPa。(3)钎焊过程中,Cu50Ti50钎料中的Ti与Si3N4发生反应。ti(1)氮化(s) + 4 = 4锡(s) + 3 si (s)和氮化硅(s) + 9 ti(1) = 4锡(s) Ti5Si3(年代)。在Si3N4与填料界面处形成TiN相、Ti5Si3相、填料中部形成Cu-Si相。TiN在连接界面处的生长活化能为206.3 kJ/mol, TiN的生长主要受N在TiN中的扩散影响。随着钎焊温度的升高,Cu-Ti相的硅含量在%Si时增加约7 ~ %Si时增加约20。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Joining of Silicon Nitride Using Amorphous Cu-Ti Filler Metal(Materials, Metallurgy & Weldability)
Si3N4/Si3N4 joint was made using Cu66Ti34, Cu50Ti50 and Cu43Ti57 amorphous filler metals, where pressureless sintered Si3N4 was used. The joining strength of Si3N4 joint was measured by fracture shear testing, and the joining mechanism was investigated by microstructure observation with SEM, and elements analyses at the joint interface with EDX and EPMA. The results obtained are summarized as follows.(1) The molten Cu-Ti alloys containing 20 at% Ti or more exhibit the equilibrium contact angle of about 8°, and are applicable to the filler metal for joining of Si3N4.(2) The joining strength of Si3N4 using Cu66Ti34 filler is higher than that of Si3N4 using other Cu-Ti fillers at any brazing temperature except for brazing temperature of 1273 K. Thus, the joining strength of Si3N4 with Cu66Ti34 filler shows the maximum value of 313.8 MPa at brazing temperature of 1323 K. At the brazing temperature of 1373 K, Si3N4 joint with Cu50Ti50 filler shows the maximum value of 176.5 MPa at brazing time of 1.8 ks, and gradually decreases with longer brazing lime, and to 19.6 MPa at brazing time of 7.2 ks. The elevated temperature fracture shear strength of Si3N4 joint brazed at 1373 K for 1.8 ks using Cu50Ti50 filler increases to 199.1 MPa at 373 K, and gradually decreases to 105.9 MPa at 973 K.(3) During brazing Ti in molten Cu50Ti50 filler reacts with Si3N4 by the following reactions. Si3N4(s) +4Ti(1)=4TiN(s)+3Si(s), and Si3N4(s)+9Ti(1)=4TiN(s)Ti5Si3(s). TiN at the interface between Si3N4 and the filler, Ti5Si3, and Cu-Si phase at the central part of the filler are formed. The activation energy for growth of TiN at the joining interface is 206.3 kJ/mol, and the growth of TiN is dominated by the diffusion of N in TiN. The silicon content of the Cu-Ti phase increases about 7 at%Si to about 20 at%Si with increasing the brazing temperature.
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