有机高分子材料的直接键合

G.A.C.M. Spierings, J. Haisma, F.J.H.M. van der Kruis
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引用次数: 21

摘要

当有机高分子材料的表面制备得干净、光滑且易于直接键合时,就可以实现有机高分子材料的直接键合。在表面处理过程中,摩擦化学抛光是必不可少的步骤。聚合材料,如聚甲基丙烯酸甲酯(PMMA)、聚芳酸酯、聚酰亚胺和聚碳酸酯,要么与自身结合,要么与另一种聚合物结合,要么与硅或熔融二氧化硅等无机材料结合。室温键的表面键能高得惊人:0.1-0.2 J/m2。加热加强直接结合;例如,在PMMA的玻璃化温度(105℃)下退火的键合PMMA/PMMA晶圆对,表面键合强度增加到7.8 J/m2。这表明结合的表面是熔融的,并通过化学键相互连接。当聚合物与低热膨胀材料(如Si和熔融二氧化硅)结合时,在退火处理过程中,热应力会导致结合晶圆对的无机部分断裂。通过限制最大退火温度或粘结区域的尺寸,可以避免断裂。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Direct bonding of organic polymeric materials

Direct bonding of organic polymeric materials can be realized when their surfaces are prepared in such a way that they are clean, smooth and susceptible to direct-bonding. In the surface-preparation process, tribo-chemical polishing is an essential step. Polymeric materials such as polymethylmethacrylate (PMMA), polyarylate, polyimide and polycarbonate were bonded either to themselves, to another polymer or to an inorganic material such as silicon or fused silica. The surfacial bond energy of the room temperature bond is surprisingly high: 0.1–0.2 J/m2. Heating strengthens the direct bond; for example, for a bonded PMMA/PMMA wafer pair annealed at the glass-transition temperature of PMMA (105°C), the surfacial bond strength increases to 7.8 J/m2. This indicates that the bonded surfaces are fused and are interlinked by chemical bonds. When polymers are bonded to low-thermal-expansion materials such as Si and fused silica, during annealing treatments, thermal stresses can induce fracturing of the inorganic part of the bonded wafer pair. By limiting the maximum annealing temperature or the size of the bonded area, fracturing can be avoided.

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