为不断发展的先进包装行业提供高生产率PVD解决方案

F. Balon, P. Carazzetti, J. Weichart, Mohamed Elghazzali, M. Hoffmann
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引用次数: 1

摘要

先进封装严重依赖于有机/聚合物薄膜和模具晶圆的使用,如扇出晶圆级封装(FOWLP)。这种晶圆的加工带来了挑战,可能导致高接触电阻(Rc)、产量损失、维护成本增加和工具生产率降低。在本文中,我们关注如何克服这些挑战的新方法。结果表明,与最新一代Arctic ICP溅射蚀刻相结合的大气批处理Degas和冷却器模块可实现超过45片/小时的处理量,蚀刻屏蔽套件寿命超过30,000片,RDL/UBM处理中的Rc值低而稳定。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High productivity PVD solution for an ever-evolving advanced packaging industry
Advanced Packaging relies heavily on the use of organic/polymer films and mold wafers such as Fan-Out Wafer-Level-Packages (FOWLP). Processing of such wafers poses challenges, potentially resulting in a high contact resistance (Rc), yield loss, increased maintenance costs and low tool productivity. In this paper we focus on novel approaches how to overcome these challenges. It is shown that the combination of Atmospheric Batch Degas and Cooler Modules in connection with the latest generation of Arctic ICP Sputter Etch results in a throughput of more than 45wafers/hour, Etch Shields Kit Lifetime exceeding 30'000 wafers, low and stable Rc values in RDL/UBM processing.
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