合金的电沉积XV: Bi-In合金的电沉积和x射线结构

Y.N. Sadana, Z.Z. Wang
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引用次数: 3

摘要

在以二乙烯三胺五乙酸离子为络合剂的水溶液中,电沉积了含有高达90% In的铋合金。电流密度的增加和镀液中铟含量的增加降低了镀层中铋的百分比。电流效率随电流密度的增加而降低,但不受镀液中铟含量变化的显著影响。含有63%-89% In的镀层具有良好的视觉质量,有望作为装饰饰面。报道了沉积合金的x射线相结构。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electrodeposition of alloys XV: Electrodeposition and x-ray structure of Bi-In alloys

Bi-In alloys containing up to 90% In were electrodeposited from aqueous solutions containing the diethylenetriaminepentaacetate ion as the complexing agent. An increase in the current density and the indium content of the bath decreased the percentage of bismuth in the deposit. The current efficiency decreased with increasing current density but was not significantly affected by a change in the indium content of the bath. Deposits containing 63%–89% In were of good visual quality and offer promise as a decorative finish. The X-ray phase structure of the deposited alloys is reported.

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