掺杂非晶GeH薄膜中杂质诱导的表面声波衰减

K.L. Bhatia, S. Hunklinger
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引用次数: 0

摘要

表面声波(SAW)技术已被应用于掺杂非晶GeH薄膜中,以获得缺陷性质的信息。在掺杂P或B的a-GeH溅射薄膜中,在0.5 ~ 475 K的温度范围内测量了300 MHz和1.5 GHz的声呐衰减。还进行了声速测量。在A - ge (H,P)和A - ge (H,B)薄膜中观察到低温下的强吸收最大值。退火对声表面波的衰减和速度有明显的影响。从声电相互作用的角度讨论了这些杂质诱导的特征。有趣的是,a-Ge(H,B)薄膜似乎具有玻璃所特有的隧道态。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Impurity-induced surface acoustic wave attenuation in doped amorphous GeH thin films

The technique of surface acoustic wave (SAW) has been applied to doped amorphous GeH films to gain information on the nature of defects. The attenuation of SAW of 300 MHz and 1.5 GHz has been measured in sputtered films of a-GeH doped with P or B at temperatures between 0.5 and 475 K. Sound velocity measurements are also made. A strong absorption maximum at low temperature is observed in a-Ge(H,P) and a-Ge(H,B) films. Distinct effects of annealing on the attenuation and velocity of SAW are observed. These impurity induced features are discussed in the light of acoustoelectric interaction. It is interesting to observe that a-Ge(H,B) film seems to have tunneling states characteristic of glasses.

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