Y. Fujimura, O. Hirabayashi, T. Sasaki, A. Suzuki, A. Kawasumi, Y. Takeyama, K. Kushida, G. Fukano, A. Katayama, Y. Niki, T. Yabe
{"title":"采用32nm高k金属栅极CMOS,采用0.149µm2电池,设计了一种具有恒定负电平写入缓冲器的可配置SRAM,用于低压操作","authors":"Y. Fujimura, O. Hirabayashi, T. Sasaki, A. Suzuki, A. Kawasumi, Y. Takeyama, K. Kushida, G. Fukano, A. Katayama, Y. Niki, T. Yabe","doi":"10.1109/ISSCC.2010.5433813","DOIUrl":null,"url":null,"abstract":"This paper presents a configurable SRAM for low-voltage operation with constant-negative-level write buffer (CNL-WB) and level programmable wordline driver for single supply (LPWD-SS) operation. CNL-WB is suitable for compilable SRAMs and it improves write margin by featuring an automatic BL-level adjustment for configuration range of four to 512 cells/BL using a replica-BL technique. LPWD-SS optimizes the tradeoff between disturb and write margin of a memory cell, allowing a 60% shorter WL rise time than that of the conventional design [1] at 0.7V. A test-chip is fabricated in a 32nm high-k metal-gate CMOS technology with a 0.149µm2 6T-SRAM cell. Measurement results demonstrate a cell-failure rate improvement of two orders of magnitude for an array-configuration range of 64 to 256 rows by 64 to 256 columns.","PeriodicalId":6418,"journal":{"name":"2010 IEEE International Solid-State Circuits Conference - (ISSCC)","volume":"1 1","pages":"348-349"},"PeriodicalIF":0.0000,"publicationDate":"2010-03-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"34","resultStr":"{\"title\":\"A configurable SRAM with constant-negative-level write buffer for low-voltage operation with 0.149µm2 cell in 32nm high-k metal-gate CMOS\",\"authors\":\"Y. Fujimura, O. Hirabayashi, T. Sasaki, A. Suzuki, A. Kawasumi, Y. Takeyama, K. Kushida, G. Fukano, A. Katayama, Y. Niki, T. Yabe\",\"doi\":\"10.1109/ISSCC.2010.5433813\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents a configurable SRAM for low-voltage operation with constant-negative-level write buffer (CNL-WB) and level programmable wordline driver for single supply (LPWD-SS) operation. CNL-WB is suitable for compilable SRAMs and it improves write margin by featuring an automatic BL-level adjustment for configuration range of four to 512 cells/BL using a replica-BL technique. LPWD-SS optimizes the tradeoff between disturb and write margin of a memory cell, allowing a 60% shorter WL rise time than that of the conventional design [1] at 0.7V. A test-chip is fabricated in a 32nm high-k metal-gate CMOS technology with a 0.149µm2 6T-SRAM cell. Measurement results demonstrate a cell-failure rate improvement of two orders of magnitude for an array-configuration range of 64 to 256 rows by 64 to 256 columns.\",\"PeriodicalId\":6418,\"journal\":{\"name\":\"2010 IEEE International Solid-State Circuits Conference - (ISSCC)\",\"volume\":\"1 1\",\"pages\":\"348-349\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-03-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"34\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 IEEE International Solid-State Circuits Conference - (ISSCC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSCC.2010.5433813\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 IEEE International Solid-State Circuits Conference - (ISSCC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSCC.2010.5433813","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A configurable SRAM with constant-negative-level write buffer for low-voltage operation with 0.149µm2 cell in 32nm high-k metal-gate CMOS
This paper presents a configurable SRAM for low-voltage operation with constant-negative-level write buffer (CNL-WB) and level programmable wordline driver for single supply (LPWD-SS) operation. CNL-WB is suitable for compilable SRAMs and it improves write margin by featuring an automatic BL-level adjustment for configuration range of four to 512 cells/BL using a replica-BL technique. LPWD-SS optimizes the tradeoff between disturb and write margin of a memory cell, allowing a 60% shorter WL rise time than that of the conventional design [1] at 0.7V. A test-chip is fabricated in a 32nm high-k metal-gate CMOS technology with a 0.149µm2 6T-SRAM cell. Measurement results demonstrate a cell-failure rate improvement of two orders of magnitude for an array-configuration range of 64 to 256 rows by 64 to 256 columns.