Na离子注入对多晶CuIn1−xGaxSe2的影响

Wan-Yao Wu, Chia-Hsiang Chen, Chia-Hao Hsu, Shih-yuan Wei, Chien-Hsu Chen, Yun-chung Wu, T. Hong, H. Niu, C. Lai
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引用次数: 1

摘要

在本工作中,离子注入用于定量和空间控制钠在CIGS薄膜中的分布。在二次离子质谱(SIMS)深度剖面中观察到CIGS表面附近的局部na掺杂层。利用拉曼光谱和掠入射x射线衍射对快速热退火诱导的晶格位移和恢复过程进行了表征。退火后处理和植入过程中退火都能很好地减少植入引起的位移。在前期工作中,植入na的CIGS薄膜使器件的电学性能得到了提高。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The effect of Na ion implantation on the polycrystalline CuIn1−xGaxSe2
In this work, Ion implantation was applied for quantitative and spatial control of Na distribution in CIGS films. Local Na-doped layer near the CIGS surface was observed in secondary ion mass spectroscopy (SIMS) depth-profile. Implantation-induced lattice displacement and recovery processes by rapid thermal annealing were characterized by Raman spectroscopy and grazing incident X-ray diffraction. Post annealing process and annealing during implantation both can reduce implantation-induced displacement well. In the preliminary work, Na-implanted CIGS film lead to an enhancement in electrical properties of device.
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