Sumit Kumar, E. Abraham, S. Talukder, Praveen Kumar, R. Pratap
{"title":"微电光刻系统开发","authors":"Sumit Kumar, E. Abraham, S. Talukder, Praveen Kumar, R. Pratap","doi":"10.1109/icee44586.2018.8937922","DOIUrl":null,"url":null,"abstract":"The recently developed technique of micro-nano pattern drawing by electrolithography process necessitates controlled probe-tip movement on a predefined path. Here we report development of a specific micropositioner system for drawing patterns at micrometer scale. Effect of different parameters on the patterns is studied. Probe-tip velocity and tip force are found to have major impact on the pattern-dimension.","PeriodicalId":6590,"journal":{"name":"2018 4th IEEE International Conference on Emerging Electronics (ICEE)","volume":"16 1","pages":"1-4"},"PeriodicalIF":0.0000,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Micro Electrolithography System Development\",\"authors\":\"Sumit Kumar, E. Abraham, S. Talukder, Praveen Kumar, R. Pratap\",\"doi\":\"10.1109/icee44586.2018.8937922\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The recently developed technique of micro-nano pattern drawing by electrolithography process necessitates controlled probe-tip movement on a predefined path. Here we report development of a specific micropositioner system for drawing patterns at micrometer scale. Effect of different parameters on the patterns is studied. Probe-tip velocity and tip force are found to have major impact on the pattern-dimension.\",\"PeriodicalId\":6590,\"journal\":{\"name\":\"2018 4th IEEE International Conference on Emerging Electronics (ICEE)\",\"volume\":\"16 1\",\"pages\":\"1-4\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 4th IEEE International Conference on Emerging Electronics (ICEE)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/icee44586.2018.8937922\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 4th IEEE International Conference on Emerging Electronics (ICEE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/icee44586.2018.8937922","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The recently developed technique of micro-nano pattern drawing by electrolithography process necessitates controlled probe-tip movement on a predefined path. Here we report development of a specific micropositioner system for drawing patterns at micrometer scale. Effect of different parameters on the patterns is studied. Probe-tip velocity and tip force are found to have major impact on the pattern-dimension.
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