{"title":"用全反射x射线荧光分析硅片表面","authors":"W. Berneike, J. Knoth, H. Schwenke, U. Weisbrod","doi":"10.1007/BF00572369","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":12372,"journal":{"name":"Fresenius' Zeitschrift für analytische Chemie","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1989-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"20","resultStr":"{\"title\":\"Surface analysis for Si-wafers using total reflection X-ray fluorescence analysis\",\"authors\":\"W. Berneike, J. Knoth, H. Schwenke, U. Weisbrod\",\"doi\":\"10.1007/BF00572369\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":12372,\"journal\":{\"name\":\"Fresenius' Zeitschrift für analytische Chemie\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1989-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"20\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Fresenius' Zeitschrift für analytische Chemie\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1007/BF00572369\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Fresenius' Zeitschrift für analytische Chemie","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1007/BF00572369","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}