{"title":"后退火温度对碲掺杂ZnO纳米晶薄膜光学和表面性能的影响","authors":"A.U. Sonawan, B. Sonawane","doi":"10.15407/spqeo25.04.398","DOIUrl":null,"url":null,"abstract":"Investigated in this work is the effect of post-annealing temperature on ZnO nanocrystalline thin films doped with 5 at.% tellurium. The spin coating method was used to deposit films on the microscopic glass substrates. XRD, AFM, and UV-spectro-photometry were used to characterize the films structure, surface roughness and optical properties. The XRD spectra showed that the nanocrystalline films are of monocrystalline nature. AFM has confirmed the nanocrystalline character of tellurium-doped ZnO. The transmission of exposed films has been decreased with the increase of annealing temperature. The average transmission of all the films has been revealed to be higher than 80%. The optical band gap varies slightly with post-annealing temperature.","PeriodicalId":21598,"journal":{"name":"Semiconductor physics, quantum electronics and optoelectronics","volume":"292 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2022-12-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Impact of post-annealing temperature on optical and surface properties of tellurium doped ZnO nanocrystalline films\",\"authors\":\"A.U. Sonawan, B. Sonawane\",\"doi\":\"10.15407/spqeo25.04.398\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Investigated in this work is the effect of post-annealing temperature on ZnO nanocrystalline thin films doped with 5 at.% tellurium. The spin coating method was used to deposit films on the microscopic glass substrates. XRD, AFM, and UV-spectro-photometry were used to characterize the films structure, surface roughness and optical properties. The XRD spectra showed that the nanocrystalline films are of monocrystalline nature. AFM has confirmed the nanocrystalline character of tellurium-doped ZnO. The transmission of exposed films has been decreased with the increase of annealing temperature. The average transmission of all the films has been revealed to be higher than 80%. The optical band gap varies slightly with post-annealing temperature.\",\"PeriodicalId\":21598,\"journal\":{\"name\":\"Semiconductor physics, quantum electronics and optoelectronics\",\"volume\":\"292 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-12-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Semiconductor physics, quantum electronics and optoelectronics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.15407/spqeo25.04.398\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Semiconductor physics, quantum electronics and optoelectronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.15407/spqeo25.04.398","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Impact of post-annealing temperature on optical and surface properties of tellurium doped ZnO nanocrystalline films
Investigated in this work is the effect of post-annealing temperature on ZnO nanocrystalline thin films doped with 5 at.% tellurium. The spin coating method was used to deposit films on the microscopic glass substrates. XRD, AFM, and UV-spectro-photometry were used to characterize the films structure, surface roughness and optical properties. The XRD spectra showed that the nanocrystalline films are of monocrystalline nature. AFM has confirmed the nanocrystalline character of tellurium-doped ZnO. The transmission of exposed films has been decreased with the increase of annealing temperature. The average transmission of all the films has been revealed to be higher than 80%. The optical band gap varies slightly with post-annealing temperature.
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