{"title":"带图像放大器的多光束投影微干涉仪","authors":"A. M. Bakiev, S. Valiev, N. V. Kryazhev","doi":"10.1070/QE1992V022N08ABEH003589","DOIUrl":null,"url":null,"abstract":"An experimental investigation was made of the principal properties of a multibeam projection microinterferometer with a copper-vapor image amplifier. The optical system and the operating principle of the microinterferometer are described. It is shown that the lower limit of the height of a microstructure which can be determined is less than 10 nm. If the edges of the microstructure are sharp, the upper limit can reach 5λ, where λ = 0.5782 μm is the wavelength of the radiation of the copper-vapor image amplifier.","PeriodicalId":21878,"journal":{"name":"Soviet Journal of Quantum Electronics","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1992-08-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"MULTIBEAM PROJECTION MICROINTERFEROMETER WITH AN IMAGE AMPLIFIER\",\"authors\":\"A. M. Bakiev, S. Valiev, N. V. Kryazhev\",\"doi\":\"10.1070/QE1992V022N08ABEH003589\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An experimental investigation was made of the principal properties of a multibeam projection microinterferometer with a copper-vapor image amplifier. The optical system and the operating principle of the microinterferometer are described. It is shown that the lower limit of the height of a microstructure which can be determined is less than 10 nm. If the edges of the microstructure are sharp, the upper limit can reach 5λ, where λ = 0.5782 μm is the wavelength of the radiation of the copper-vapor image amplifier.\",\"PeriodicalId\":21878,\"journal\":{\"name\":\"Soviet Journal of Quantum Electronics\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1992-08-31\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Soviet Journal of Quantum Electronics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1070/QE1992V022N08ABEH003589\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Soviet Journal of Quantum Electronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1070/QE1992V022N08ABEH003589","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
MULTIBEAM PROJECTION MICROINTERFEROMETER WITH AN IMAGE AMPLIFIER
An experimental investigation was made of the principal properties of a multibeam projection microinterferometer with a copper-vapor image amplifier. The optical system and the operating principle of the microinterferometer are described. It is shown that the lower limit of the height of a microstructure which can be determined is less than 10 nm. If the edges of the microstructure are sharp, the upper limit can reach 5λ, where λ = 0.5782 μm is the wavelength of the radiation of the copper-vapor image amplifier.
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