{"title":"SOI-MOS光电二极管金线-空间表面等离子体天线粘附材料的评价","authors":"H. Satoh, Yuki Matsuo, H. Inokawa, A. Ono","doi":"10.1109/SNW.2010.5562555","DOIUrl":null,"url":null,"abstract":"In order to improve the light sensitivity of silicon-on-insulator metal-insulator-semiconductor (SOI-MOS) photodiode, differences caused by the adhesion materials for gold (Au) line-and-space (L/S) surface plasmon (SP) antenna are evaluated based on the electromagnetic simulation. Furthermore, the rejection ratio for polarized light with silicon nitride (Si3N4) adhesion layer is analyzed.","PeriodicalId":6433,"journal":{"name":"2010 Silicon Nanoelectronics Workshop","volume":"20 1","pages":"1-2"},"PeriodicalIF":0.0000,"publicationDate":"2010-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Evaluation of adhesion materials for gold line-and-space surface plasmon antenna on SOI-MOS photodiode\",\"authors\":\"H. Satoh, Yuki Matsuo, H. Inokawa, A. Ono\",\"doi\":\"10.1109/SNW.2010.5562555\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In order to improve the light sensitivity of silicon-on-insulator metal-insulator-semiconductor (SOI-MOS) photodiode, differences caused by the adhesion materials for gold (Au) line-and-space (L/S) surface plasmon (SP) antenna are evaluated based on the electromagnetic simulation. Furthermore, the rejection ratio for polarized light with silicon nitride (Si3N4) adhesion layer is analyzed.\",\"PeriodicalId\":6433,\"journal\":{\"name\":\"2010 Silicon Nanoelectronics Workshop\",\"volume\":\"20 1\",\"pages\":\"1-2\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-06-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 Silicon Nanoelectronics Workshop\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SNW.2010.5562555\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 Silicon Nanoelectronics Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SNW.2010.5562555","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Evaluation of adhesion materials for gold line-and-space surface plasmon antenna on SOI-MOS photodiode
In order to improve the light sensitivity of silicon-on-insulator metal-insulator-semiconductor (SOI-MOS) photodiode, differences caused by the adhesion materials for gold (Au) line-and-space (L/S) surface plasmon (SP) antenna are evaluated based on the electromagnetic simulation. Furthermore, the rejection ratio for polarized light with silicon nitride (Si3N4) adhesion layer is analyzed.
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