氧化铜纳米流体与水在电子冷却中的性能比较

Praveen K. Namburu, K. Das, S. R. Vajjha
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引用次数: 2

摘要

本文采用数值方法比较了水和氧化铜纳米流体在层流状态下作为电子器件散热器的平行板通道中的性能。这里考虑的几何形状通常用于设计适合冷却空气冷却不足的微处理器芯片阵列的散热器。详细分析了纳米流体浓度对通道内局部摩擦系数、平均摩擦系数、努塞尔数和对流换热系数的影响。在雷诺数为100 ~ 2000的范围内,通过数值模拟计算了纳米颗粒体积浓度对表面摩擦和传热的影响。分析表明,该散热器内的流动是流体动力和热发展的,并给出了局部表面摩擦和局部努塞尔数的轴向变化。以体积浓度为8%的CuO纳米流体为例,计算结果表明,在雷诺数为2000时,其平均传热系数比纯水增加了近2倍。从表2的详细分析可以看出,压力损失随着颗粒浓度的增加而增加。对于稀释浓度为2%的CuO纳米流体,预测其泵送功率略高于水,约为10%。对于昂贵的电子芯片的热保护,在芯片成本占主导地位的应用中,这可能是可以容忍的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Comparison of the Performance of Copper Oxide Nanofluid with Water in Electronic Cooling
A numerical study to compare the performance of water and copper oxide (CuO) nanofluid flowing under laminar regime in a parallel-plate channel, serving as a heat sink in an electronic device, has been presented. The geometry considered here is commonly used in the design of heat sinks suitable for cooling an array of microprocessor chips for which air cooling is insufficient. The influence of nanofluids concentration on local and average skin friction coefficients, Nusselt numbers, and convective heat-transfer coefficients in the channel have been analyzed in detail. The increases in the skin friction and heat transfer with volumetric concentration of nanoparticles have been evaluated from numerical simulations in the Reynolds number range of 100 to 2000. The analysis shows that the flow in this heat sink is hydrodynamically and thermally developing, for which the axial variations of local skin friction and local Nusselt number are presented. As an example, computational results for an 8 % volumetric concentration of CuO nanofluid shows that at a Reynolds number of 2000, the average heat-transfer coefficient increases nearly by a factor of 2 in comparison with pure water. From a detailed analysis summarized in Table 2, it is observed that there is an increase in the pressure loss as the particle concentration increases. For the CuO nanofluid of dilute concentration of 2 %, a slightly higher pumping power of about 10 % compared to water is predicted. This may be tolerable for the thermal protection of expensive electronic chips, in applications where the chip cost is the dominant factor.
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