V. Petrov, A. Kryuchyn, I. Gorbov, A. Pankratova, D. Manko, Yu. O. Borodin, O. V. Shikhovets
{"title":"蓝宝石衬底表面亚微米浮雕结构的形成","authors":"V. Petrov, A. Kryuchyn, I. Gorbov, A. Pankratova, D. Manko, Yu. O. Borodin, O. V. Shikhovets","doi":"10.15330/pcss.24.2.298-303","DOIUrl":null,"url":null,"abstract":"An analysis of technologies that allow creating microrelief structures on the surface of sapphire substrates has been carried out. It is shown that the most effective method of forming relief structures with submicron dimensions is ion beam etching through a protective mask formed by photolithography. The main problems in creating a microrelief on the surface of sapphire substrates are the removal of static electric charge in the process of ion beam etching of the substrates, as well as obtaining a protective mask with windows of specified sizes, through which etching of the sapphire substrate is performed.","PeriodicalId":20137,"journal":{"name":"Physics and Chemistry of Solid State","volume":"18 1","pages":""},"PeriodicalIF":0.9000,"publicationDate":"2023-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Formation of submicron relief structures on the surface of sapphire substrates\",\"authors\":\"V. Petrov, A. Kryuchyn, I. Gorbov, A. Pankratova, D. Manko, Yu. O. Borodin, O. V. Shikhovets\",\"doi\":\"10.15330/pcss.24.2.298-303\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An analysis of technologies that allow creating microrelief structures on the surface of sapphire substrates has been carried out. It is shown that the most effective method of forming relief structures with submicron dimensions is ion beam etching through a protective mask formed by photolithography. The main problems in creating a microrelief on the surface of sapphire substrates are the removal of static electric charge in the process of ion beam etching of the substrates, as well as obtaining a protective mask with windows of specified sizes, through which etching of the sapphire substrate is performed.\",\"PeriodicalId\":20137,\"journal\":{\"name\":\"Physics and Chemistry of Solid State\",\"volume\":\"18 1\",\"pages\":\"\"},\"PeriodicalIF\":0.9000,\"publicationDate\":\"2023-06-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Physics and Chemistry of Solid State\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.15330/pcss.24.2.298-303\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Physics and Chemistry of Solid State","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.15330/pcss.24.2.298-303","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Formation of submicron relief structures on the surface of sapphire substrates
An analysis of technologies that allow creating microrelief structures on the surface of sapphire substrates has been carried out. It is shown that the most effective method of forming relief structures with submicron dimensions is ion beam etching through a protective mask formed by photolithography. The main problems in creating a microrelief on the surface of sapphire substrates are the removal of static electric charge in the process of ion beam etching of the substrates, as well as obtaining a protective mask with windows of specified sizes, through which etching of the sapphire substrate is performed.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
