硼对TiAl/Ti3Al的影响

C.R. Feng, D.J. Michel, C.R. Crowe
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引用次数: 19

摘要

用透射电镜研究了Ti-45Al合金和Ti-45Al/TiB2复合材料中TiAl/Ti3Al界面错配位错结构。对于c/a = 1.02的TiAl,只有一组错配位错阵列在晶体学上是可能的;在Ti-45Al合金中观察到这些现象。然而,对Ti-45Al/TiB2复合材料中三组错配位错阵列的观察表明,过量硼占据了TiAl结构中的八面体位置,导致了c/a比的降低,从而导致了TiAl/Ti3Al界面上TiAl的fcc特性的增加。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The effects of boron in TiAl/Ti3Al

The TiAl/Ti3Al interfacial misfit dislocations structures were investigated by TEM in Ti-45Al alloy and Ti-45Al/TiB2 composite. For TiAl with c/a = 1.02, only a single set of misfit dislocation arrays are crystallographically possible; these were observed in Ti-45Al alloy. However, the observation of three sets of misfit dislocation arrays in the Ti-45Al/TiB2 composite suggests that the occupation of octahedral sites in the TiAl structure by excess boron was responsible for a decrease in the c/a ratio leading to an increased fcc character of the TiAl at the TiAl/Ti3Al interface.

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