H2O2存在下盐酸土霉素的光化学降解

A. U. Rahmah, S. Harimurti, A. Omar, T. Murugesan
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引用次数: 11

摘要

高级氧化过程(AOPs)是利用羟基自由基和其他自由基作为中间体,将难降解的、有毒的、不可生物降解的化合物氧化成各种副产物的技术。本文采用UV-H2O2体系降解盐酸土霉素(OTC),该体系利用H2O2产生的羟基自由基攻击OTC。实验中,H2O2浓度、温度和pH值发生了变化。为了监测OTC的降解,进行了TOC和UV-VIS光谱分析。使用250 ppm恒定OTC浓度。在40℃、H2O2与OTC的摩尔比为1等条件下,TOC去除率约为93.06%。辐照180min后,OTC的紫外可见光谱显示OTC峰完全消失。HPLC分析表明,在UV-H2O2体系中辐照180 min后,OTC降解率约为93.08%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Photochemical degradation of oxytetracycline hydrochloride in the presence of H2O2
Advanced oxidation process (AOPs) are technologies based on the intermediacy of hycroxyl radical and other radicals to oxidize recalcitrant, toxic nad no biodegradable cpmpounds to various by- products. In this paper, Oxytetracycline hydrochloride (OTC) was degraded inside a UV-H2O2 system which utilize hydroxyl radical generated from H2O2 to attack OTC. Concentration of H2O2, temperature and pH was varied in this experiment. To monitor OTC degradation, TOC and UV-VIS spectra analysis were carried out. Constant OTC concentration at 250 ppm was used. About 93.06% of TOC removal was achieved at 40°C and 1 eq mole ratio H2O2 to OTC. After 180 min irradiation, UV-Vis spectra of OTC have shown total disappearance of OTC peak. HPLC analyses has shown about 93.08% of OTC were degraded after 180 min irradiated inside UV-H2O2 system.
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