{"title":"氮化镓薄膜CVD的原位气相紫外光谱研究","authors":"S. Alexandrov, A. Kovalgin, D. Krasovitskiy","doi":"10.1051/JPHYSCOL:1995520","DOIUrl":null,"url":null,"abstract":"Direct in situ UV spectroscopic analysis of the gas phase was performed during chemical vapour deposition of gallium nitride films based on pyrolysis of GaCl 3 NH 3 complexes. The most probable mechanism of film formation is proposed on the basis of the experimental results obtained.","PeriodicalId":17944,"journal":{"name":"Le Journal De Physique Colloques","volume":"4 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"1995-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"A Study of CVD of Gallium Nitride Films by In Situ Gas-Phase UV Spectroscopy\",\"authors\":\"S. Alexandrov, A. Kovalgin, D. Krasovitskiy\",\"doi\":\"10.1051/JPHYSCOL:1995520\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Direct in situ UV spectroscopic analysis of the gas phase was performed during chemical vapour deposition of gallium nitride films based on pyrolysis of GaCl 3 NH 3 complexes. The most probable mechanism of film formation is proposed on the basis of the experimental results obtained.\",\"PeriodicalId\":17944,\"journal\":{\"name\":\"Le Journal De Physique Colloques\",\"volume\":\"4 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Le Journal De Physique Colloques\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1051/JPHYSCOL:1995520\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Le Journal De Physique Colloques","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1051/JPHYSCOL:1995520","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A Study of CVD of Gallium Nitride Films by In Situ Gas-Phase UV Spectroscopy
Direct in situ UV spectroscopic analysis of the gas phase was performed during chemical vapour deposition of gallium nitride films based on pyrolysis of GaCl 3 NH 3 complexes. The most probable mechanism of film formation is proposed on the basis of the experimental results obtained.
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