双源晶体管尺寸减小的优化制造方法

International Journal of Online Engineering Pub Date : 2017-07-30 DOI:10.5121/IJOE.2017.6301

P. E.L

{"title":"双源晶体管尺寸减小的优化制造方法","authors":"P. E.L","doi":"10.5121/IJOE.2017.6301","DOIUrl":null,"url":null,"abstract":"In this paper we introduce an approach to optimize technological process of manufacturing of heterotransistors with two sources to decrease their dimensions. Framework the approach we consider a heterostructure with specific configuration. After manufacturing of the heterostructure we consider doping of several areas of the heterostructure by diffusion or ion implantation. The doping was finished by optimized annealing of dopant and/or radiation defects. We introduce an analytical approach for prognosis of mass transport to obtain the required results.","PeriodicalId":14375,"journal":{"name":"International Journal of Online Engineering","volume":"55 1","pages":"01-11"},"PeriodicalIF":0.0000,"publicationDate":"2017-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"On Approach to Optimize Manufacturing of a Transistors with Two Sources to Decrease their Dimensions\",\"authors\":\"P. E.L\",\"doi\":\"10.5121/IJOE.2017.6301\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper we introduce an approach to optimize technological process of manufacturing of heterotransistors with two sources to decrease their dimensions. Framework the approach we consider a heterostructure with specific configuration. After manufacturing of the heterostructure we consider doping of several areas of the heterostructure by diffusion or ion implantation. The doping was finished by optimized annealing of dopant and/or radiation defects. We introduce an analytical approach for prognosis of mass transport to obtain the required results.\",\"PeriodicalId\":14375,\"journal\":{\"name\":\"International Journal of Online Engineering\",\"volume\":\"55 1\",\"pages\":\"01-11\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-07-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Journal of Online Engineering\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.5121/IJOE.2017.6301\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of Online Engineering","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.5121/IJOE.2017.6301","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

本文介绍了一种优化双源异质晶体管制造工艺的方法，以减小其尺寸。在此框架下，我们考虑具有特定构型的异质结构。在制备异质结构后，我们考虑通过扩散或离子注入对异质结构的几个区域进行掺杂。通过对掺杂剂和/或辐射缺陷进行优化退火来完成掺杂。我们介绍了一种预测质量输运的分析方法，以获得所需的结果。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

On Approach to Optimize Manufacturing of a Transistors with Two Sources to Decrease their Dimensions

In this paper we introduce an approach to optimize technological process of manufacturing of heterotransistors with two sources to decrease their dimensions. Framework the approach we consider a heterostructure with specific configuration. After manufacturing of the heterostructure we consider doping of several areas of the heterostructure by diffusion or ion implantation. The doping was finished by optimized annealing of dopant and/or radiation defects. We introduce an analytical approach for prognosis of mass transport to obtain the required results.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

International Journal of Online Engineering COMPUTER SCIENCE, INTERDISCIPLINARY APPLICATIONS-

自引率

0.00%

发文量

审稿时长

12 weeks

期刊介绍： We would like to inform you, that iJOE, the ''International Journal of Online Engineering'' will accept now also papers in the field of Biomedical Engineering and e-Health''. iJOE will therefore be published from January 2019 as the ''International Journal of Online and Biomedical Engineering''. The objective of the journal is to publish and discuss fundamentals, applications and experiences in the fields of Online Engineering (remote engineering, virtual instrumentation and online simulations, etc) and Biomedical Engineering/e-Health. The use of cyber-physical systems, virtual and remote controlled devices and remote laboratories are the directions for advanced teleworking/e-working environments. In general, online engineering is a future trend in engineering and science. Due to the growing complexity of engineering tasks, more and more specialized and expensive equipment as well as software tools and simulators, shortage of highly qualified staff, and the demands of globalization and collaboration activities, it become essential to utilize cyber cloud technologies to maximize the use of engineering resources. Online engineering is the way to address these issues. Considering these, one focus of the International Journal of Online and Biomedical Engineering is to provide a platform to publish fundamentals, applications and experiences in the field of Online Engineering, for example: Remote Engineering Internet of Things Cyber-physical Systems Digital Twins Industry 4.0 Virtual Instrumentation. An important application field of online engineering tools and principles are Biomedical Engineering / e-Health. Topics we are interested to publish are: Automation Technology for Medical Applications Big Data in Medicine Biomedical Devices Biosensors Biosignal Processing Clinical Informatics Computational Neuroscience Computer-Aided Surgery.